公开(公告)号：EP1325386A1

公开(公告)日：2003-07-09

申请号：EP01973468.0

申请日：2001-09-26

申请人： CORNING INCORPORATED

发明人： ACKERMAN, Bradford, G. ,  BOWDEN, Bradley, F. ,  DAVIS, Claude, L., Jr. ,  HRDINA, Kenneth, E.

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70216 ,  G03F7/708

摘要： A lithographic stage includes a platen (31) having a top face and a bottom face and a holder (32) for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.

公开(公告)号：EP1324857A1

公开(公告)日：2003-07-09

申请号：EP01979254.8

申请日：2001-09-18

申请人： CORNING INCORPORATED

发明人： DAVIS, Claude, L., Jr. ,  BEST, Michael, E. ,  EDWARDS, Mary, J.,CORNING INCORPORATED ,  HOBBS, Thomas, W.,CORNING INCORPORATED ,  MURRAY, Gregory, L.

IPC分类号： B24B7/24

CPC分类号： B24B1/00 ,  B24B13/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0252

摘要： A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material (41) to produce an EUV mirror blank (43) and polishing a top face of the EUV mirror blank (43) to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material (61); sagging a plate of the glass material over the top face of the piece (63) to produce an EUV mirror blank (66); and polishing a top face of the EUV mirror blank to produce an EUV polished mirror (65).

公开(公告)号：EP1238302A1

公开(公告)日：2002-09-11

申请号：EP00972260.4

申请日：2000-10-18

申请人： CORNING INCORPORATED

发明人： DAVIS, Claude, L., Jr. ,  LINDER, Michael, W.

IPC分类号： G02B7/182

CPC分类号： G02B7/182

摘要： An inexpensive lightweight mirror blank having good dimensional stability, and a method of making the same is provided. The mirror blank includes an extruded ceramic honeycomb core and a faceplate bonded or otherwise affixed to the front surface of the core. The extruded honeycomb core is comprised of a matrix of cell walls defining an array of cells, with the number of cells being greater than about 16 cells per square inch, to render the core extremely light in weight yet sufficiently rigid and strong to support the optical faceplate. The faceplate is formed from a material that is capable of being polished to an optical surface. An optional back plate can be bonded or otherwise affixed to the back surface of the core in order to improve stiffness and mechanical stability of the mirror blank.

公开(公告)号：EP1214718A1

公开(公告)日：2002-06-19

申请号：EP00948609.3

申请日：2000-07-10

申请人： CORNING INCORPORATED

发明人： DAVIS, Claude, L., Jr. ,  HRDINA, Kenneth, E.

IPC分类号： G21K5/00 ,  C23C14/02 ,  C23C28/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/42 ,  G02B5/0891 ,  G02B17/0615 ,  G02B17/0636 ,  G03F1/24 ,  G03F1/60 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

摘要： The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation μ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation μ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation μ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

摘要翻译： 用于制造集成电路和形成具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照明级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。 保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。