Silicon carbide bipolar transistor and method of fabricating thereof
    1.
    发明公开
    Silicon carbide bipolar transistor and method of fabricating thereof 有权
    硅铋 - 双极晶体管和Verfahren zu dessen Herstellung

    公开(公告)号:EP1806787A1

    公开(公告)日:2007-07-11

    申请号:EP06126735.7

    申请日:2006-12-20

    申请人: CREE, INC.

    IPC分类号: H01L29/732 H01L29/24

    摘要: A bipolar junction transistor (BJT) includes a silicon carbide (SiC) collector layer (316) of first conductivity type, as epitaxial silicon carbide base layer (320) of second conductivity type on the silicon carbide collector layer, and an epitaxial silicon carbide emitter mesa (330) of the first conductivity type on the epitaxial silicon carbide base layer. An epitaxial silicon cacbite passivation layer (350) of the first conductivity type is provided on at least a portion of the epitaxial silicon carbide base layer outside the silicon carbide emitter mesa. The epitaxial silicon carbide passivation layer can be configured to deplete fully at zero device bias. Related fabrication methods also are disclosed.

    摘要翻译: 双极结型晶体管(BJT)包括第一导电类型的碳化硅(SiC)集电极层(316),作为在碳化硅集电极层上的第二导电类型的外延碳化硅基底层(320)和外延碳化硅发射极 在外延碳化硅基底层上的第一导电类型的台面(330)。 在碳化硅发射极台面外的外延碳化硅基底层的至少一部分上设置有第一导电类型的外延硅碳化物钝化层(350)。 外延碳化硅钝化层可以被配置为在零器件偏置下完全耗尽。 还公开了相关的制造方法。