摘要:
A bipolar junction transistor (BJT) includes a silicon carbide (SiC) collector layer (316) of first conductivity type, as epitaxial silicon carbide base layer (320) of second conductivity type on the silicon carbide collector layer, and an epitaxial silicon carbide emitter mesa (330) of the first conductivity type on the epitaxial silicon carbide base layer. An epitaxial silicon cacbite passivation layer (350) of the first conductivity type is provided on at least a portion of the epitaxial silicon carbide base layer outside the silicon carbide emitter mesa. The epitaxial silicon carbide passivation layer can be configured to deplete fully at zero device bias. Related fabrication methods also are disclosed.