公开(公告)号：EP1257924A4

公开(公告)日：2007-06-20

申请号：EP01910429

申请日：2001-02-05

申请人： CYMER INC

发明人： PATEL PARTHIV S ,  CONWAY JOSEPH E ,  TANTRA MULJADI ,  MOEN JEFFREY W ,  CARLESI JASON R ,  GREEN ROGER L ,  WATSON TOM A ,  ROWAN CHRISTOPHER G

IPC分类号： G03F7/20 ,  G06F15/00 ,  G05B23/02 ,  G06F11/30 ,  G07C3/00 ,  H01L21/027 ,  H01L21/268 ,  H01S3/00

CPC分类号： G03F7/70991 ,  G03F7/70525 ,  G03F7/70975 ,  G05B2219/31205 ,  G05B2219/31485 ,  G07C3/005 ,  Y02P90/86

摘要： A system for a monitoring lithography laser (2) at least one integrated circuit fabrication plants. Each laser (2) at each fabrication plant has associated with it a terminal server (6). With respect to each fabrication plant a central control server unit (8) is in communication with each of the lasers (2) through a local area network (7). Information from the lasers (2) is collected by the central control server unit (8) and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.