专利检索 ap:("Cabot Microelectronics Corporation") AND inv:"BOLDRIDGE, David, W., c/o Cabot Microelect. Corp." 第 1 页

1.

发明授权
ANIONIC ABRASIVE PARTICLES TREATED WITH POSITIVELY-CHARGED POLYELECTROLYTES FOR CMP 有权
标题翻译：带正电的聚电解质处理的阴离子磨料CHEMO机械抛光

公开(公告)号：EP1483349B1

公开(公告)日：2007-12-26

申请号：EP03739720.5

申请日：2003-02-10

申请人： Cabot Microelectronics Corporation

发明人： CHERIAN, Isaac, K., c/o Cabot Microelect. Corp. , CARTER, Phillip, W., c/o Cabot Microelect. Corp. , CHAMBERLAIN, Jeffrey, P., c/o Cabot Microel. Corp. , MOEGGENBORG, Kevin, J., c/o Cabot Microelec. Corp. , BOLDRIDGE, David, W., c/o Cabot Microelect. Corp.

IPC分类号： C09G1/16

CPC分类号： C09K3/1454 , B24B37/044 , B24B37/046 , C09G1/02 , C09K3/1436

摘要： The invention provides chemical-mechanical polishing systems, and methods of polishing a substrate using the polishing systems, comprising (a) an abrasive, (b) a liquid carrier, and (c) a positively charged polyelectrolyte with a molecular weight of about 15,000 or more, wherein the abrasive comprises particles that are electrostatically associated with the positively charged polyelectrolyte.