摘要:
The invention relates to an imaging system in which a diffractive optical element is used by both the illumination beam path and the imaging beam path. Said diffractive element operates in the reflection mode or transmission mode according to the specifications of the system design. At least one of the imaging optical elements provided in the beam path of the inventive diffractive beam splitter for imaging systems is used for both the illumination beam path and the imaging beam path. Said element represents a diffractive optical element (DOE) and requires no spatial separation between the imaging beam path and the illumination beam path in the object space by using different diffraction arrays. The number of reflective optical elements can be decreased by using diffractive optical elements, resulting in the cost of the system being reduced and the service life of the optical components being increased by using a low-power EUV source.
摘要:
The invention relates to an arrangement for inspecting objects, especially masks in microlithography. Said masks are disposed in a vacuum chamber. A converter converts illuminating radiation emitted from the object into radiation of a higher wave length. A sensor is also provided for recording images. The sensor is disposed outside the vacuum chamber and is arranged as an optical interface between the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
摘要:
The invention relates to an optical system for homogenizing an at least partially coherent light field, especially one emitted by a laser, preferably by an excimer laser. The optical system according to the invention essentially comprises an optical cycle, at least one coupling element for coupling a light field into the optical cycle and at least one decoupling element. The light field (1) or a portion of said light field (1) coupled into the cycle repeatedly passes the optical cycle, thereby at least partially deforming the wave front of the light field (1). Portions of the light field (1) are coupled out when they have passed the optical cycle once or several times. The light field (1) is coupled into the optical cycle with a predetermined wave front. During the repeated passage of the optical cycle, portions of the light field (1) whose wave fronts deviate from one another are coupled out of the cycle. If the laser radiation is pulsed, the distances across which the individual portions of the light field travel are longer than the temporal coherence length.
摘要:
The invention relates to an arrangement for inspecting objects, especially masks in microlithography. Said masks are disposed in a vacuum chamber. A converter converts illuminating radiation emitted from the object into radiation of a higher wave length. A sensor is also provided for recording images. The sensor is disposed outside the vacuum chamber and is arranged as an optical interface between the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.