公开(公告)号：EP2122393A2

公开(公告)日：2009-11-25

申请号：EP08707756.6

申请日：2008-02-18

申请人： Carl Zeiss SMT AG

发明人： WARM, Berndt ,  RENNON, Sigfried ,  DINGER, Udo ,  BAIER, Jürgen ,  BURKART, Stefan ,  KOUROUKLIS, Christos ,  CHUNG, Hin Yiu Anthony ,  WIESNER, Stefan ,  ENKISCH, Hartmut ,  DENGEL, Günther

IPC分类号： G02B5/09 ,  G03F7/20 ,  G02B7/18

CPC分类号： G02B5/08 ,  B29D11/00596 ,  G02B5/09 ,  G03F7/702 ,  G03F7/70825

摘要： The invention relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors according to the invention.

公开(公告)号：EP2203785A1

公开(公告)日：2010-07-07

申请号：EP08841328.1

申请日：2008-10-11

申请人： Carl Zeiss SMT AG

发明人： MANN, Hans-Jürgen ,  ULRICH, Wilhelm ,  MÜLLENDER, Stephan ,  ENKISCH, Hartmut

IPC分类号： G03F7/20

CPC分类号： G02B5/0891 ,  G02B13/143 ,  G02B17/06 ,  G03F7/70175 ,  G03F7/70233

摘要： An imaging optical system (7) has a plurality of mirrors (M1 to M6). These image an object field (4) in an object plane (5) into an image field (8) in an image plane (9). In the imaging optical system (7), the ratio of a maximum angle of incidence of imaging light (15) on reflection surfaces of the mirrors (M1 to M6) and an image-side numerical aperture of the imaging optical system (7) is less than 33.8°. This results in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.

公开(公告)号：EP1502157A1

公开(公告)日：2005-02-02

申请号：EP02807393.0

申请日：2002-11-13

申请人： Carl Zeiss SMT AG

发明人： ENKISCH, Birgit ,  ENKISCH, Hartmut ,  GRUNER, Toralf

IPC分类号： G03F7/20 ,  G02B1/02

摘要： The invention relates to a method for producing an optical blank (1) consisting of a crystalline material, as a preliminary stage for the production of a lens or a lens element for an objective, especially a projection objective for a microlithography projection exposure installation. According to the inventive method, the orientation of a first crystal direction (3) defined inside the crystalline structure is determined first of all. The optical blank (1) is then worked in such a way that the first crystal direction (3) is essentially perpendicular to an optical raw surface (7) of the optical blank (1). A marking is then applied to the optical blank (1) or to a holding mount of the optical blank (1), said marking being related to a second crystal direction (11) in a defined manner. The second crystal direction forms an angle different from zero with the first crystal direction (3).