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公开(公告)号：EP1668419A2
公开(公告)日：2006-06-14
申请号：EP03785715.8
申请日：2003-12-03
申请人： Carl Zeiss SMT AG
发明人： HEINTEL, Willi , KIRCHNER, Harald , KELLER, Wolfgang , KWAN, Yim-Bun, Patrick , FROMMEYER, Andreas , MORRISON, Fraser, G.
CPC分类号： G03F7/70825 , G02B7/181 , G02B7/182
摘要： An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).
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公开(公告)号：EP1668419B1
公开(公告)日：2010-07-28
申请号：EP03785715.8
申请日：2003-12-03
申请人： Carl Zeiss SMT AG
发明人： HEINTEL, Willi , KIRCHNER, Harald , KELLER, Wolfgang , KWAN, Yim-Bun, Patrick , FROMMEYER, Andreas , MORRISON, Fraser, G.
CPC分类号： G03F7/70825 , G02B7/181 , G02B7/182
摘要： An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).
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公开(公告)号：EP2002301A1
公开(公告)日：2008-12-17
申请号：EP07723892.1
申请日：2007-04-02
申请人： Carl Zeiss SMT AG
发明人： SCHERLE, Hans-Jürgen , KWAN, Yim-Bun, Patrick , XALTER, Stefan , LIPPERT, Johannes , WEBER, Ulrich , GEUPPERT, Bernhard , GELLRICH, Bernhard , KUGLER, Jens , SORG, Franz , HEINTEL, Willi , KIRCHNER, Harald , KELLER, Wolfgang , FROMMEYER, Andreas , MORRISON, Fraser, G.
CPC分类号： G02B17/0812 , G03F7/70225 , G03F7/70825
摘要： There is provided an optical element comprising an optical element body (107.1, 108.1), a reflecting area (107.4, 108.4) and an optical passageway (107.6, 108.6). The optical element body defines an axis of rotational symmetry (107.3, 108.3). The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.
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