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9 条记录 (耗时 0.012 秒)

    OPTICAL IMAGING ARRANGEMENT
    2.
    发明公开
    OPTICAL IMAGING ARRANGEMENT 审中-公开
    光学成像装置

    公开(公告)号：EP1886191A2

    公开(公告)日：2008-02-13

    申请号：EP06761961.9

    申请日：2006-06-02

    申请人： Carl Zeiss SMT AG

    发明人： KWAN, Yim-Bun, Patrick

    IPC分类号： G03F7/20 ,  G02B7/00 ,  H01L21/00 ,  G03F9/00

    CPC分类号： G03F7/709 ,  G03F7/70233 ,  G03F7/70258 ,  G03F7/70775 ,  G03F7/70833

    摘要： There is provided an optical imaging arrangement comprising: a mask unit (3) comprising a pattern (3.1) a substrate unit (4) comprising a substrate (4.1), an optical projection unit (2) comprising a group (5) of optical element units, the optical projection unit (2) being adapted to transfer an image of the pattern (3.1) onto the substrate (4.1), a first imaging arrangement component (8.1), the first imaging arrangement component being a component of one of the optical element units, a second imaging arrangement component (4.2), the second imaging arrangement component being different from the first imaging arrangement component and being a component of one of the mask unit (3), the optical projection unit (2) and the substrate unit (4), and a metrology arrangement (10). The metrology arrangement captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement comprises a reference element, the reference element (10.2) being mechanically connected directly to the first imaging arrangement component.

    OPTICAL ASSEMBLY FOR PHOTOLITHOGRAPHY
    4.
    发明公开
    OPTICAL ASSEMBLY FOR PHOTOLITHOGRAPHY 审中-公开
    光学装置光刻

    公开(公告)号：EP1678559A1

    公开(公告)日：2006-07-12

    申请号：EP03782454.7

    申请日：2003-12-18

    申请人： Carl Zeiss SMT AG ,  ASML Netherlands B.V.

    发明人： KWAN, Yim-Bun, Patrick ,  LOOPSTRA, Erik

    IPC分类号： G03F7/20 ,  G02B5/00

    CPC分类号： G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

    摘要： An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

    DIAPHRAGM CHANGING DEVICE
    5.
    发明公开
    DIAPHRAGM CHANGING DEVICE 审中-公开
    隔膜改变装置

    公开(公告)号：EP1678558A1

    公开(公告)日：2006-07-12

    申请号：EP03782453.9

    申请日：2003-12-18

    申请人： Carl Zeiss SMT AG

    发明人： BIEG, Hermann ,  WILL, Marcus ,  BISCHOFF, Thomas ,  KWAN, Yim-Bun, Patrick ,  NGUYEN, Uy-Liem ,  XALTER, Stefan ,  MÜHLBEYER, Michael

    IPC分类号： G03F7/20 ,  G02B5/00

    CPC分类号： G03F7/70191 ,  G02B5/005 ,  G02B13/143 ,  G02B17/02 ,  G03F7/7025 ,  G03F7/70825 ,  G21K1/04 ,  G21K1/067

    摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.

    摘要翻译： 本发明涉及一种光学成像装置，尤其是用于EUVL领域中用于微光刻的物镜（1），用于制造具有光束路径（2），多个光学元件（3）和光圈装置（7）的光路（2） 具有可调膜片开口形状。 光阑装置具有光阑存储器（7a，7b），光阑存储器（7a，7b）具有分别具有固定形状的多个不同的光阑开口（6），这些光阑开口可以被引入到光束路径（2）中。