公开(公告)号：EP1984789A1

公开(公告)日：2008-10-29

申请号：EP07722838.5

申请日：2007-02-16

申请人： Carl Zeiss SMT AG

发明人： DEGÜNTHER, Markus ,  LAYH, Michael ,  GERHARD, Michael ,  THOME, Bruno ,  SINGER, Wolfgang

IPC分类号： G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70191

摘要： An illumination system (5) for microlithography serves for the illumination of an illumination field (3). A light distribution device (9, 10) that is preferably used generates a two-dimensional intensity distribution in a first illumination plane (11). A first raster arrangement (12) composed of optical raster elements generates a raster arrangement of secondary light sources. A device having an additional optical action is assigned to the two raster arrangement (12; 16) in a spatially adjacent manner, which device may be formed as an illumination angle variation device (14). The device (14) having an additional optical action influences the intensity and/or the phase and/or the beam direction of the illumination light (8). This influencing is such that an intensity contribution of raster elements (23, 28) to the total illumination intensity varies over the illumination field (3). This can influence the illumination intensity over the illumination field in a targeted manner with regard to the total illumination intensity and/or with regard to the intensity contributions from different illumination directions.