公开(公告)号：EP2126636B1

公开(公告)日：2012-06-13

申请号：EP08715667.5

申请日：2008-01-30

申请人： Carl Zeiss SMT GmbH

发明人： DIECKMANN, Nils ,  MAUL, Manfred ,  HETTICH, Christian ,  NATT, Oliver

IPC分类号： G03F7/20

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus comprises at least one transmission filter (66; 166; 266; 366; 466; 566; 666; 666'; 766, 766'; 866, 866') which has a different transmittance at least at two positions and which is arranged between a pupil plane (42, 60) and a field plane (52, 58). The transmittance distribution is determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.