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    ILLUMINATION SYSTEM COMPRISING A FOURIER OPTICAL SYSTEM
    2.
    发明公开
    ILLUMINATION SYSTEM COMPRISING A FOURIER OPTICAL SYSTEM 有权
    傅立叶光学系统，照明系统和微光刻曝光系统

    公开(公告)号：EP2288963A1

    公开(公告)日：2011-03-02

    申请号：EP09741805.7

    申请日：2009-04-17

    申请人： Carl Zeiss SMT GmbH

    发明人： SCHWAB, Markus ,  LAYH, Michael ,  DEGUENTHER, Markus ,  HOEGELE, Artur

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： An illumination system (190) for a microlithography projection exposure apparatus (100) for illuminating an illumination field (165) with the light from a primary light source (102) has a variably adjustable pupil shaping unit (150) for receiving light from the primary light source (102) and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface (110) of the illumination system. The pupil shaping unit (150) has a Fourier optical system (500) for converting an entrance beam bundle (105) entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length f
    FOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis and the condition (L/f
    FOS )