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    BELEUCHTUNGSSYSTEM FÜR DIE MIKRO-LITHOGRAPHIE
    1.
    发明公开
    BELEUCHTUNGSSYSTEM FÜR DIE MIKRO-LITHOGRAPHIE 有权
    BELEUCHTUNGSSYSTEMFÜRDIE MIKRO-LITHOGRAPHIE

    公开(公告)号：EP2382510A1

    公开(公告)日：2011-11-02

    申请号：EP10701208.0

    申请日：2010-01-25

    申请人： Carl Zeiss SMT GmbH

    发明人： SCHOLZ, Axel ,  SCHLESENER, Frank ,  HAVERKAMP, Nils ,  DAVYDENKO, Vladimir ,  GERHARD, Michael ,  ZIEGLER, Gerhard-Wilhelm ,  KERN, Mirco ,  BISCHOFF, Thomas ,  STAMMLER, Thomas ,  KELLNER, Stephan ,  MAUL, Manfred ,  WALLDORF, Daniel ,  HUREVICH, Igor ,  DEGÜNTHER, Markus

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

    摘要： An illumination system for microlithography is used to illuminate an illumination field by the illumination light of a primary light source. A first grid assembly (12) has bundle-shaped first grid elements (24) that are arranged in a first plane of the illumination system or neighboring the same. The first grid assembly (12) is used to create a grid assembly of secondary light sources. A transmission lens is used for the superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission lens has a second grid assembly (15) having bundle-shaped second grid elements (26). Each of the grid elements (24) of the first grid assembly (12) is associated with one of the grid elements (26) of the second grid assembly (15) for guiding a partial bundle (25) of an entire bundle of the illumination light. For example, the first grid assembly (12) has at least two types (I, II, III) of the first grid elements (24), which differ in their bundle-influencing effect. The grid elements (24, 26) of the two grid assemblies (12, 15) are arranged in relation to one another such that every grid element type (I through III) is associated with at least one individual distance (Δ
    I , Δ
    II , Δ
    III ) between the first grid element (24) of said type (I through III) and the associated second grid element (26) of the second grid assembly (15). The result is an illumination system by means of which an influence of specific illumination parameters is possible, if possible without the undesirable influence of other illumination parameters.

    摘要翻译： 用于微光刻的照明系统用于利用初级光源的照明光照射照明场。 第一光栅装置具有布置在照明系统的第一平面中或与平面相邻的束形成第一光栅元件。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将二次光源的照明光的叠加传输到照明场。 透射光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的光栅元件之一被分配给第二光栅装置的光栅元件之一，用于引导整束照明光的部分光束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅布置的光栅元件相对于彼此布置，使得每个光栅元素类型（I至III）被分配至少一个单独的距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅排列的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大限度地避免对其他照明参数的不期望的影响。