公开(公告)号：EP2317386A3

公开(公告)日：2011-06-01

申请号：EP11001162.4

申请日：2008-12-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Fiolka, Damian ,  Müller, Ralf ,  Major, András

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70116

Abstract: An illumination system of a microlithographic projection exposure apparatus is configured to illuminate a mask (16) with light pulses and comprises a beam deflection array (46) of reflective or transparent beam deflection elements (M ij ). Each beam deflection element (M ij ) is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The illumination system further comprises a system pupil surface (70) in which an irradiance distribution is produced by the beam deflection array. A control unit (50) is provided that is configured to control the beam deflection elements such that the illuminated area associated with an irradiance distribution produced in the system pupil surface (70) changes between two consecutive light pulses (LP n , LP n+1 ) of an exposure process during which the mask (16) is imaged on a light sensitive surface (22).

公开(公告)号：EP2317386A2

公开(公告)日：2011-05-04

申请号：EP11001162.4

申请日：2008-12-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Fiolka, Damian ,  Müller, Ralf ,  Major, András

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70116

Abstract: An illumination system of a microlithographic projection exposure apparatus is configured to illuminate a mask (16) with light pulses and comprises a beam deflection array (46) of reflective or transparent beam deflection elements (M ij ). Each beam deflection element (M ij ) is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The illumination system further comprises a system pupil surface (70) in which an irradiance distribution is produced by the beam deflection array. A control unit (50) is provided that is configured to control the beam deflection elements such that the illuminated area associated with an irradiance distribution produced in the system pupil surface (70) changes between two consecutive light pulses (LP n , LP n+1 ) of an exposure process during which the mask (16) is imaged on a light sensitive surface (22).

Abstract translation: 微光刻投影曝光装置的照明系统被配置为用光脉冲照亮掩模（16），并且包括反射或透射束偏转元件（M ij）的光束偏转阵列（46）。 每个光束偏转元件（M ij）适于使入射光束偏转响应于控制信号而变化的偏转角。 照明系统还包括系统光瞳表面（70），其中光束偏转阵列产生辐照度分布。 提供控制单元（50），其被配置为控制光束偏转元件，使得与系统光瞳表面（70）中产生的辐照度分布相关联的照明区域在两个连续的光脉冲（LP n，LP n + 1 ），其中所述掩模（16）在光敏表面（22）上成像的曝光过程。

公开(公告)号：EP2317386B1

公开(公告)日：2012-07-11

申请号：EP11001162.4

申请日：2008-12-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Fiolka, Damian ,  Müller, Ralf ,  Major, András

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70116

公开(公告)号：EP2202580B1

公开(公告)日：2011-06-22

申请号：EP08022311.8

申请日：2008-12-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Fiolka, Damian ,  Müller, Ralf ,  Major, András

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70116