公开(公告)号：EP1879071B1

公开(公告)日：2013-06-12

申请号：EP07013477.0

申请日：2007-07-10

Applicant: Carl Zeiss SMT GmbH

Inventor： Kohl, Alexander, Dr.

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466 ,  G03F7/70566

公开(公告)号：EP2040283A4

公开(公告)日：2012-02-08

申请号：EP07768367

申请日：2007-07-09

Applicant: NIPPON KOGAKU KK

Inventor： SHIGEMATSU KOJI ,  TANITSU OSAMU

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70108 ,  G03F7/70091 ,  G03F7/70208 ,  G03F7/70466

Abstract: An illumination optical apparatus is able to quickly perform switching of illumination conditions between illumination in a first region and illumination in a second region. The illumination optical apparatus of the present invention to illuminate an illumination target surface (M) on the basis of light from a light source (1) comprises: a path switching member (3, 4) arranged in an optical path between the light source and the illumination target surface and switching an optical path of an exiting beam between a first optical path and a second optical path; a path combining member (5) combining the first optical path and the second optical path; a first pupil distribution forming member (12, 13, 15, 16, 6) arranged in the first optical path and forming a predetermined light intensity distribution on an illumination pupil; and a second pupil distribution forming member (22, 23, 25, 26, 6) arranged in the second optical path and forming a predetermined light intensity distribution on the illumination pupil.

公开(公告)号：EP2317386A2

公开(公告)日：2011-05-04

申请号：EP11001162.4

申请日：2008-12-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Fiolka, Damian ,  Müller, Ralf ,  Major, András

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70116

Abstract: An illumination system of a microlithographic projection exposure apparatus is configured to illuminate a mask (16) with light pulses and comprises a beam deflection array (46) of reflective or transparent beam deflection elements (M ij ). Each beam deflection element (M ij ) is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The illumination system further comprises a system pupil surface (70) in which an irradiance distribution is produced by the beam deflection array. A control unit (50) is provided that is configured to control the beam deflection elements such that the illuminated area associated with an irradiance distribution produced in the system pupil surface (70) changes between two consecutive light pulses (LP n , LP n+1 ) of an exposure process during which the mask (16) is imaged on a light sensitive surface (22).

Abstract translation: 微光刻投影曝光装置的照明系统被配置为用光脉冲照亮掩模（16），并且包括反射或透射束偏转元件（M ij）的光束偏转阵列（46）。 每个光束偏转元件（M ij）适于使入射光束偏转响应于控制信号而变化的偏转角。 照明系统还包括系统光瞳表面（70），其中光束偏转阵列产生辐照度分布。 提供控制单元（50），其被配置为控制光束偏转元件，使得与系统光瞳表面（70）中产生的辐照度分布相关联的照明区域在两个连续的光脉冲（LP n，LP n + 1 ），其中所述掩模（16）在光敏表面（22）上成像的曝光过程。

公开(公告)号：EP1879071A3

公开(公告)日：2010-03-31

申请号：EP07013477.0

申请日：2007-07-10

Applicant: Carl Zeiss SMT AG

Inventor： Kohl, Alexander, Dr.

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466 ,  G03F7/70566

Abstract: Eine Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage (1) dient zur Ausleuchtung einer Objektoberfläche (19) mit Beleuchtungslicht (3, 3') einer Lichtquelle (2, 2'). Zur Einstellung mindestens zweier Beleuchtungssettings in einer Pupillenebene (12) der Beleuchtungsoptik dienen mindestens zwei voneinander separate optische Baugruppen (28, 29). Im Lichtweg vor diesen ist ein Auskoppelelement (9) angeordnet, welches wahlweise das Beleuchtungslicht (3, 3') der ersten (28) und/oder der zweiten (29) optischen Baugruppe zuführt. Im Lichtweg nach den beiden optischen Baugruppen (28, 29) ist ein Einkoppelelement (35) angeordnet, das das Beleuchtungslicht (3, 3'), welches die erste (28) und/oder die zweite (29) optische Baugruppe passiert hat, dem Beleuchtungsfeld zuführt. Es resultieren eine Beleuchtungsoptik und ein zusätzlich die Lichtquelle aufweisendes Beleuchtungssystem, das einen schnellen Wechsel zwischen Beleuchtungssettings ermöglicht.

公开(公告)号：EP2005253A1

公开(公告)日：2008-12-24

申请号：EP07741659.2

申请日：2007-04-10

Applicant: Nikon Corporation

Inventor： NOBORU, Michio ,  SHIRAISHI, Naomasa

IPC: G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70208 ,  G03F7/70466

Abstract: An illumination optical system (IU) of a projection exposure apparatus for projecting and exposing a pattern of a reticle (R) onto a wafer (W) comprises a secondary relay optical system (22) for forming a plane (62) optically conjugate with a reticle surface between an exposure light source (10) and the reticle (R), and an optical path combining mirror (21) for combining exposure light beams (IL1, IL2) from the exposure light source (10) so that they illuminate the reticle surface closely to each other there, wherein the optical path combining mirror (21) includes reflecting surfaces (21a, 21b) for respectively reflecting the exposure light beams (IL1, IL2), and wherein a ridge line (21c) at the boundary between the reflecting surfaces (21a, 21b) is arranged on or near the plane (62).

公开(公告)号：EP1566697A2

公开(公告)日：2005-08-24

申请号：EP05250801.7

申请日：2005-02-11

Applicant: ASML Netherlands B.V.

Inventor： Gui, Cheng-Qun ,  Bleeker, Arno Jan ,  De Jager, Pieter Willem Herman ,  Sytsma, Joost

IPC: G03F7/20

CPC classification number: G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

Abstract: Provided is a radiation distribution system (7;15;20;30) for distributing the radiation from an illumination system (IL) to two or more patterning means (PPM;8), each for patterning beams of radiation (PB;6), which are subsequently projected onto a substrate (W).

Abstract translation: 提供了一种用于将来自照明系统（IL）的辐射分配到两个或更多个图案化装置（PPM; 8）的辐射分布系统（7; 15; 20; 30），每个用于构图辐射束（PB; 6）， 随后将其投影到衬底（W）上。

公开(公告)号：EP1443361A2

公开(公告)日：2004-08-04

申请号：EP04001974.7

申请日：2004-01-29

Applicant: CANON KABUSHIKI KAISHA

Inventor： Iizuka, Kazuo ,  Isohata, Junji ,  Tanaka, Nobuyoshi

IPC: G03F1/14 ,  G03F7/20

CPC classification number: G03F7/7005 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70308 ,  G03F7/70358 ,  G03F7/70466 ,  G03F7/70791

Abstract: A projection exposure mask with a small size and low cost for exposing a member to form a continuous pattern and a discontinuous pattern thereon is disclosed. The projection exposure mask has a first mask pattern for exposing the member to form the continuous pattern thereon and a second mask pattern for exposing the member to form the discontinuous pattern thereon. One of the first and second mask patterns is a reflecting type mask pattern, and the other mask pattern is a transmitting mask pattern.

Abstract translation: 公开了一种具有小尺寸和低成本的投影曝光掩模，用于使构件暴露以形成连续图案和不连续图案。 投影曝光掩模具有用于使构件暴露以形成其上的连续图案的第一掩模图案和用于使构件暴露以在其上形成不连续图案的第二掩模图案。 第一和第二掩模图案中的一个是反射型掩模图案，另一个掩模图案是透射掩模图案。

公开(公告)号：EP1275033A1

公开(公告)日：2003-01-15

申请号：EP01922177.9

申请日：2001-04-10

Applicant: MICRONIC LASER SYSTEMS AB

Inventor： SANDSTRÖM, Torbjörn ,  HOLMER, Anna-Karin ,  LJUNGBLAD, Ulric ,  HANSTORP, Dag

IPC: G03F7/20 ,  H01S3/00

CPC classification number: G03F7/70558 ,  G03F7/70208 ,  G03F7/70291

Abstract: A system for creating a pattern on a workpiece sensitive to light radiation, such as a photomask, a display panel or a microoptical device, comprising a source for emitting light pulses in the wavelength range from EUV to IR, a spatial light modulator (SLM) having at least one modulating element (pixel), adapted to being illuminated by at least one emitted light pulse and a projection system creating an image of the modulator on the workpiece. Further, the system comprises a fast pulse detector to detect an output pulse energy of each individual pulse and produce for each said individual pulse, a signal corresponding to the output pulse energy of said individual pulse, a switch having response times in the nanosecond or sub-nanosecond range for blocking portions of each pulse, said switch being configured to be controlled by said signals from said last pulse detector, so as to control the energy output of each individual pulse to approximately a desired energy output based on the output pulse energy measurement of said individual pulse.

公开(公告)号：EP1978546A4

公开(公告)日：2010-08-04

申请号：EP06843445

申请日：2006-12-27

Applicant: NIPPON KOGAKU KK

Inventor： NAGASAKA HIROYUKI

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70283 ,  G03F1/70 ,  G03F7/70208 ,  G03F7/70275

Abstract: An exposure apparatus EX includes a light source unit 1 which emits an exposure light beam EL; and an illumination system IL which includes a splitting optical system 13 splitting the exposure light beam EL emitted from the light source unit 1 into a first exposure light beam EL1 and a second exposure light beam EL2, and which illuminates a first pattern PA1 with the first exposure light beam EL1 and illuminates a second pattern PA2 with the second exposure light beam EL2; wherein a predetermined area on a substrate P is multiply exposed by radiating the first exposure light beam EL1 from the first pattern PA1 and the second exposure light beam EL2 from the second pattern PA2 onto the predetermined area on the substrate P.

公开(公告)号：EP2109004A1

公开(公告)日：2009-10-14

申请号：EP09250895.1

申请日：2009-03-27

Applicant: ASML Holding N.V. ,  ASML Netherlands BV

Inventor： Sewell, Harry ,  Benschop, Jozef Petrus Henricus

IPC: G03F7/20 ,  H01L21/20

CPC classification number: G03F7/70283 ,  G03F7/70208

Abstract: A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination systems for alternately directing pulses of the radiation beam to the respective illumination systems, a support table for holding a plurality of patterning devices, each of the patterning devices being capable of imparting a respective conditioned radiation beam with a pattern in its cross-section to form a plurality of patterned radiation beams, and a projection system configured to project each of the plurality of patterned radiation beams coincidentally onto a target portion of a substrate. In an embodiment, the substrate is covered with a phase change material.

Abstract translation: 公开了一种用于将两个图案形成装置同时曝光到衬底上的光刻设备和方法。 在一个实施例中，光刻设备包括用于接收和调节脉冲辐射束的多个照射系统，布置在脉冲辐射源和照射系统之间的束导向器，用于交替地将辐射束的脉冲引导到各个照射系统 用于保持多个图案形成装置的支撑台，所述图案形成装置中的每一个能够将各自的经调节的辐射束赋予其横截面中的图案以形成多个图案化的辐射束，以及投影系统， 多个图案化的辐射束中的每一个同时地到衬底的目标部分上。 在一个实施例中，衬底被相变材料覆盖。