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    PROCEDE ET DISPOSITIF DE TRAITEMENT D'UN MATERIAU SOUS L'EFFET D'UN CHAMP MAGNETIQUE
    2.
    发明公开
    PROCEDE ET DISPOSITIF DE TRAITEMENT D'UN MATERIAU SOUS L'EFFET D'UN CHAMP MAGNETIQUE 有权
    方法和一种用于治疗材料的磁场

    公开(公告)号：EP2459757A1

    公开(公告)日：2012-06-06

    申请号：EP10737068.6

    申请日：2010-07-29

    申请人： Centre National de la Recherche Scientifique (C.N.R.S.) ,  Universite Joseph Fourier - Grenoble 1

    发明人： GARCIN, Thomas ,  RIVOIRARD, Sophie ,  SIBEUD, Pierre-Frédéric ,  BEAUGNON, Eric

    IPC分类号： C21D1/04

    CPC分类号： C21D1/04

    摘要： The invention relates to a method for treating a material in a static magnetic field with an intensity of more than 1 Tesla, including the following steps: a first step of heating the material, a second step of applying a thermal shock and/or a thermomechanical and/or chemical treatment to the material, characterised in that, at least during the second treatment step, the material is exposed to the magnetic field and held stationary inside said magnetic field. The invention also relates to a device for implementing said method, said device including: a mounting for holding the material during the steps of the cycle, a device for applying said static magnetic field capable of generating a magnetic field with an intensity of more than 1 Tesla, a first system for heating the material, a second system for implementing said subsequent step of the cycle, characterised in that the mounting is arranged such as to hold the material stationary relative to the magnetic field during the steps of the cycle and in that the first and second systems are mobile relative to the magnetic field.