公开(公告)号：EP1810312A1

公开(公告)日：2007-07-25

申请号：EP05798778.6

申请日：2005-11-02

申请人： Chemfilt Ionsputtering Aktiebolag

发明人： KOUZNETSOV, Vladimir ,  ARVÉN-MAYER, Patrick ,  BÖHLMARK, Johan ,  JOHANSSON, Mats ,  CARLSSON, Johan

IPC分类号： H01J37/02 ,  B23H1/02 ,  B23K9/09 ,  H05B7/02 ,  H05B7/144

CPC分类号： H05B6/68 ,  H01J37/3405 ,  H01J37/3444 ,  H01J37/3467 ,  H01J61/90 ,  H05B41/34

摘要： In producing discharges in a load element such as a magnetron sputtering device, electric pulses are provided from different electric pulse sources, e.g. three or more electric pulse sources. The pulse sources are controlled by a control and monitoring unit to give the element electric pulses different heights and start and end times. The element electric pulses are summed, such as by connecting the pulse sources in parallel to the load, to form resulting, relatively long electric pulses. Each of the resulting electric pulses can have a portion that has a substantially constant level and then the substantially constant level is formed from at least two element electric pulses having the same pulse height. The resulting electric pulses are applied to electrodes in the load. The element electric pulses can have the same polarity such as being half a period of a sinusoid oscillation of a single frequency. Then the time intervals between starts of successive element electric pulses are relatively short such as not being not larger than one third of the period of the sinusoid. For example, the resulting electric pulses can have a substantially rectangular shape, a shape including two different substantially constant levels or have a substantially triangular shape.