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公开(公告)号:EP4420811A1
公开(公告)日:2024-08-28
申请号:EP24155930.1
申请日:2024-02-06
发明人: Werner, Jürgen , Friese, Jan Michael , Wacker, Christian , Dueck, Patrick , Hertel, Kai , Roidl, Benedikt , Graf, Dominic , Bechmann, Florian , Stroessner, Johannes
IPC分类号: B22F10/28 , B22F10/366 , B22F12/45 , B29C64/153 , B29C64/282 , B29C64/393 , B33Y10/00 , B33Y50/02 , B33Y80/00
CPC分类号: B22F10/28 , B22F12/45 , B22F10/366 , B33Y10/00 , B33Y80/00 , B29C64/393 , B33Y50/02 , B29C64/153 , B29C64/282
摘要: A method (300) of additively manufacturing a three-dimensional object (114) by one or more energy beams (134). The method (300) includes selectively directing a first energy beam (134a) across a powder bed (134) along a plurality of first hatching paths (151a) and a first contour path (190) that defines a first outer contour portion (192) and a first stitching portion (194), wherein the first outer contour portion (192) at least partially defines a first edge portion (153a) of an outer edge (153) of the three-dimensional object (114), and wherein the first edge portion (153a) is non-linear. The method (300) further includes selectively directing a second energy beam (134b) across the powder bed (134) along a plurality of second hatching paths (151b) and a second contour path (210) that at least partially defines a second edge portion (153b) of the outer edge (153) of the three-dimensional object (114), wherein the second edge portion (153b) is adjacent the first edge portion (153a), and wherein the first stitching portion (194) extends into the plurality of second hatching paths (153b) along a non-linear stitching path (200).
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2.
公开(公告)号:EP4124401A1
公开(公告)日:2023-02-01
申请号:EP22176174.5
申请日:2022-05-30
申请人: Concept Laser GmbH
IPC分类号: B22F10/36 , B22F12/45 , B22F12/90 , B33Y10/00 , B22F10/28 , B33Y50/02 , B22F10/368 , B23K26/06 , B22F12/44 , G02B26/06 , G02F1/00
摘要: An irradiation device (142) for an apparatus for additively manufacturing three-dimensional object (114), the irradiation device (142) comprising:
a working beam generation device (200) configured to provide a working beam (206);
a modulation beam generation device (202) configured to provide a modulation beam (208);
a solid-state optical modulator (204) comprising a crystalline material (214) that exhibits a change in refractive index in response to photoexcitation of free electrons (216) within the crystalline material (214); and
a power source (218) coupled to the solid-state optical modulator (204), the power source (218) configured to introduce free electrons (216) into the crystalline material (214);
wherein the modulation beam (208), when incident upon the crystalline material (214), causes photoexcitation of the free electrons (216) within the crystalline material (214), and the photoexcitation of the free electrons (216) within the crystalline material (214) causes the crystalline material (214) to exhibit the change in refractive index; and
wherein the working beam (206), when incident upon the crystalline material (214), undergoes a phase shift attributable at least in part to the change in refractive index exhibited by the crystalline material (214).
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