公开(公告)号：EP1386377A1

公开(公告)日：2004-02-04

申请号：EP02769660.8

申请日：2002-04-17

申请人： Cymer, Inc.

发明人： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

IPC分类号： H01S3/22 ,  H01S3/223

CPC分类号： G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.