公开(公告)号：EP2412067A4

公开(公告)日：2015-06-24

申请号：EP10756630

申请日：2010-03-18

申请人： CYMER LLC

发明人： YE HONG ,  SANDSTROM RICHARD L ,  ROKITSKI SLAVA ,  BROWN DANIEL J W ,  RAFAC ROBERT J

IPC分类号： H01S3/083 ,  H01S3/08 ,  H01S3/10 ,  H01S3/105 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/225 ,  H01S3/02 ,  H01S3/0804 ,  H01S3/0805 ,  H01S3/08059 ,  H01S3/08072 ,  H01S3/08081 ,  H01S3/0835 ,  H01S3/10092 ,  H01S3/1053 ,  H01S3/235 ,  H01S3/2366

公开(公告)号：EP2656456A2

公开(公告)日：2013-10-30

申请号：EP11813691.0

申请日：2011-12-15

申请人： Gigaphoton Inc.

发明人： NOWAK, Krzysztof ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

IPC分类号： H01S3/23 ,  H01S3/00 ,  H05G2/00

CPC分类号： H01S3/0085 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S2301/02 ,  H05G2/008

摘要： A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.

公开(公告)号：EP1521942B1

公开(公告)日：2013-03-06

申请号：EP03736659.8

申请日：2003-05-23

申请人： Cymer, Inc.

发明人： SANDSTROM, Richard, L. ,  MELCHIOR, John, T. ,  RAO, Rahasekhar

IPC分类号： G01B9/02 ,  G01J9/02 ,  G01J1/42 ,  G01J3/26 ,  G01J3/02 ,  H01S3/225

CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

公开(公告)号：EP2412067A1

公开(公告)日：2012-02-01

申请号：EP10756630.9

申请日：2010-03-18

申请人： Cymer, Inc.

发明人： YE, Hong ,  SANDSTROM, Richard, L. ,  ROKITSKI, Slava ,  BROWN, Daniel, J. W. ,  RAFAC, Robert, J.

IPC分类号： H01S3/083

CPC分类号： H01S3/225 ,  H01S3/02 ,  H01S3/0804 ,  H01S3/0805 ,  H01S3/08059 ,  H01S3/08072 ,  H01S3/08081 ,  H01S3/0835 ,  H01S3/10092 ,  H01S3/1053 ,  H01S3/235 ,  H01S3/2366

摘要： A laser includes a regenerative ring resonator that includes a discharge chamber having electrodes and a gain medium between the electrodes for producing a laser beam; a partially-reflective optical coupler, and a beam modification optical system in the path of the laser beam, The beam modification optical system transversely expands a profile of the laser beam such that the near field laser beam profile uniformly fills each aperture within the laser and such that the regenerative ring resonator remains either conditionally stable or marginally unstable when operating the laser at powers that induce thermal lenses In optical elements Inside the regenerative ring resonator.

公开(公告)号：EP1458066A3

公开(公告)日：2006-04-19

申请号：EP04011567.7

申请日：2002-08-19

申请人： Cymer, Inc.

发明人： Knowles, David S. ,  Brown, Daniel J.,W. ,  Sandstrom, Richard, L. ,  Rylov, German E. ,  Onkels, Eckehard, D. ,  Besaucele, Herve A. ,  Myers, David, W. ,  Ershov, Alexander, I. ,  Partlo, William N. ,  Fomenkov, Igor, V. ,  Ujazdowski, Richard, C. ,  Ness, Richard, M. ,  Smith, Scot, T. ,  Hulburd, William, G.

IPC分类号： H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.

公开(公告)号：EP1438772A4

公开(公告)日：2006-03-29

申请号：EP02773221

申请日：2002-08-19

申请人： CYMER INC

发明人： KNOWLES DAVID S ,  BROWN DANIEL J W ,  SANDSTROM RICHARD L ,  RYLOV GERMAN E ,  ONKELS ECKEHARD D ,  BESAUCELE HERVE A ,  MYERS DAVID W ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  NESS RICHARD M ,  SMITH SCOT T ,  HULBURD WILLIAM G

IPC分类号： H01L21/027 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.

摘要翻译： 一种非常窄的两室高重复率F 2气体放电激光系统。 A）第一激光单元，包括：1）第一放电室， a）第一激光气体b）限定第一放电区域的第一对细长间隔开的电极，2）第一风扇，其在所述第一放电区域中产生所述第一激光气体充分的气体运动，以从所述第一放电区域清除， 每次气体放电时，​​在以4,000次气体放电/秒或更大的范围内的重复率运行时，在下一次气体放电之前基本上全部放电产生离子，3）从第一激光气体B去除热能的第一热交换器系统 ）线选择单元，使单个所选线谱外的能量最小化; C）第二激光单元，包括：1）第二放电室，包含：a）第二激光气体，b）第二对细长间隔开的电极， 第二排出区域2）第二风扇，用于在所述第二排放区域产生所述第二激光气体的足够的气体运动，以便在每个气体排放之后从所述第二排放区域清除 在以每秒或更多的4,000次气体放电的范围内的重复频率操作时，在下一个气体放电之前，所有放电产生离子，3）从第二激光气体去除热能的第二热交换器系统，D）脉冲功率 系统，被配置为向所述第一对电极和所述第二对电极提供电脉冲，足以以每秒约4,000个激光输出脉冲的速率产生激光输出脉冲，其精确控制的激光输出脉冲能量超过约5mJ，E ）激光束测量和控制系统，用于测量由所述两腔激光器系统产生的激光输出脉冲的激光输出脉冲能量，并且在反馈控制装置中控制所述激光输出脉冲，并且其中利用来自所述第一激光单元的输出激光束 作为用于播种所述第二激光单元的种子束。

公开(公告)号：EP1226634A4

公开(公告)日：2006-03-22

申请号：EP00990902

申请日：2000-10-10

申请人： CYMER INC

发明人： PARTLO WILLIAM N ,  PAN XIAOJIANG ,  ONKELS ECKEHARD D

IPC分类号： H01S3/03 ,  H01S3/038 ,  G03F7/20 ,  H01S3/034 ,  H01S3/036 ,  H01S3/07 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/073 ,  H01S3/225 ,  H01S3/2333

摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge, along with laser optics, create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes (18A) and discharges are arranged so that debris from one of the gain medium is not circulated to the other gain medium during discharges until the debris has made a loop around at least 90 % of the chamber circulation path.

公开(公告)号：EP1218980A4

公开(公告)日：2006-03-22

申请号：EP00968374

申请日：2000-09-19

申请人： CYMER INC

发明人： ERSHOV ALEXANDER I ,  ONKELS ECKEHARD D ,  DAS PALASH P ,  PARTLO WILLIAM N ,  HOFMANN THOMAS

IPC分类号： G03F7/20 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/102 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

CPC分类号： H01S3/10092 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/2366

摘要： A turnable injection seeded very narrow band F2 lithography laser. The laser (60) combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam (LNP15) operated in a first gain medium which beam (102) is used to stimulate narrow bnd lasing in a second gain medium to produce a very narrow band laser useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers (164A, 164B) are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.

摘要翻译： 可转动的注射接种非常窄的F2光刻激光器。 激光器（60）将现有技术的长寿命可靠光刻激光器的模块化设计特征与特殊技术结合以产生在第一增益介质中操作的种子光束（LNP15），该光束（102）用于以第二增益刺激窄带激光 介质来产生用于集成电路光刻的非常窄带的激光器。 在一个优选实施例中，使用两个可调校准器输出耦合器（164A，164B）来使F2激光器的频带变窄，并且在F2放大器中放大种子激光器的输出。

公开(公告)号：EP1540783A2

公开(公告)日：2005-06-15

申请号：EP03772177.6

申请日：2003-07-30

申请人： Cymer, Inc.

发明人： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

公开(公告)号：EP1378036A1

公开(公告)日：2004-01-07

申请号：EP02731237.0

申请日：2002-04-02

申请人： Cymer, Inc.

发明人： NESS, Richard, M. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander, I.

IPC分类号： H01S3/10 ,  H01S3/00 ,  H01S3/22 ,  H01S3/223 ,  H01S3/14 ,  H01S3/097

CPC分类号： H01S3/2366 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/10092 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2325 ,  H01S3/2333

摘要： A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.