公开(公告)号：EP1391017A1

公开(公告)日：2004-02-25

申请号：EP02769658.2

申请日：2002-04-15

申请人： Cymer, Inc.

发明人： WITTAK, Christian, J. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  MELCHER, Paul, C. ,  JOHNS, David, M. ,  SAETHRE, Robert, B. ,  NESS, Richard, M. ,  RETTIG, Curtis, L. ,  SHANNON, Robert, A. ,  UJAZDOWSKI, Richard, C. ,  ROKNI, Shahryar ,  SMITH, Scott ,  ANDERSON, Stuart, L. ,  ALGOTS, John, M. ,  SPANGLER, Ronald, L. ,  FOMENKOV, Igor ,  STEIGER, Thomas, D. ,  EMILO, Jerome, A. ,  TITUS, Clay, C. ,  IVASCHENKO, Alex P. ,  ZAMBON, Paolo ,  PADMABANDU, Gamaralalage G. ,  BRANHAM, Mark S. ,  PHATAK, Sanjay ,  CYBULSKI, Raymond

IPC分类号： H01S3/10 ,  H01S3/04 ,  H01S3/22 ,  H01S3/223

CPC分类号： G03F7/70025 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.