公开(公告)号：EP1794655B1

公开(公告)日：2011-12-28

申请号：EP05856776.9

申请日：2005-06-01

申请人： Dow Corning Corporation ,  The Regents of the University of Michigan

发明人： FU, Peng-Fei ,  GUO, Lingjie, Jay ,  CHENG, Xing

IPC分类号： G03F7/075 ,  G03F7/038

CPC分类号： G03F7/0382 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/0755 ,  Y10T428/31612

摘要： A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.

公开(公告)号：EP1886189A2

公开(公告)日：2008-02-13

申请号：EP05852501.5

申请日：2005-11-30

申请人： Dow Corning Corporation ,  THE REGENTS OF THE UNIVERSITY OF MICHIGAN

发明人： FU, Peng-fei ,  GUO, Lingjie, Jay

IPC分类号： G03F7/00 ,  G03F7/075 ,  C09D183/04

CPC分类号： G03F7/0755 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0757 ,  Y10T428/24802 ,  Y10T428/31663

摘要： A method of nanopatterning includes the steps of providing the resist film (12) and forming the pattern in the resist film (12). The resist film (12) includes an organosilicone compound having at least two vinyl groups, an organosilicone crosslinker different from the organosilicone compound, a catalyst, and a catalyst inhibitor. The cured resist film (12) includes the reaction product of the organosilicone compound having at least two vinyl groups and the organosilicone crosslinker different from the organosilicone compound, in the presence of the catalyst and the catalyst inhibitor. The article (10) includes a substrate (14), and the cured resist film (12) is disposed on the substrate (14). Due to the presence of the catalyst inhibitor in the resist film (12), the resist film (12) may be manipulated for hours at room temperature without curing. At the same time, the resist film (12) cures in a sufficiently short period of time to be commercially valuable.

公开(公告)号：EP2638432A2

公开(公告)日：2013-09-18

申请号：EP11793532.0

申请日：2011-11-07

申请人： Dow Corning Corporation ,  The Regents of The University of Michigan

发明人： FU, Peng-fei ,  GUO, Lingjie, Jay ,  MOYER, Eric, Scott ,  PINA-HERNANDEZ, Carlos

IPC分类号： G03F7/00 ,  G03F7/16 ,  G03F7/40

CPC分类号： B05D1/36 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/165 ,  G03F7/405 ,  Y10T428/24479 ,  Y10T428/24612

摘要： A simple and practical method that can reduce the feature size of a patterned structure bearing surface hydroxyl groups is described. The patterned structure can be obtained by any patterning technologies, such as photo-lithography, e-beam lithography, nano-imprinting lithography. The method includes: (1) initially converting the hydroxyl or silanol-rich surface into an amine-rich surface with the treatment of an amine agent, preferably a cyclic compound; (2) coating an epoxy material on the top of the patterned structure; (3) forming an extra layer when applied heat via a surface-initiated polymerization; (4) applying an amine coupling agent to regenerate the amine-rich surface; (5) coating an epoxy material on the top of the patterned structure to form the next layer; (6) repeating step 4 and 5 to form multiple layers; This method allows the fabrication of feature sizes of various patterns and contact holes that are difficult to reach by conventional lithographic methods.

公开(公告)号：EP1794655A2

公开(公告)日：2007-06-13

申请号：EP05856776.9

申请日：2005-06-01

申请人： Dow Corning Corporation ,  THE REGENTS OF THE UNIVERSITY OF MICHIGAN

发明人： FU, Peng-Fei ,  GUO, Lingjie, Jay ,  CHENG, Xing

IPC分类号： G03F7/075 ,  G03F7/038

CPC分类号： G03F7/0382 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/0755 ,  Y10T428/31612

摘要： A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.