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公开(公告)号：EP4506754A2
公开(公告)日：2025-02-12
申请号：EP24192828.2
申请日：2024-08-05
Applicant: Duksan Neolux Co., Ltd
Inventor： Kim, Jin Hyun , Kwon, Ju cheol , Lee, Changmin , Kim, Kyung Soo
Abstract: There is an effect of increasing the mechanical properties and adhesion to the base of a pattern manufactured from a photosensitive composition including a copolymer in which a monomer capable of increasing mechanical properties is introduced into the component of the benzoxazole-based copolymer resin according to the present disclosure, and a silane-based additive.
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