Gas recirculation flow control method and apparatus for use in vacuum system for semiconductor manufacture
    1.
    发明公开
    Gas recirculation flow control method and apparatus for use in vacuum system for semiconductor manufacture 审中-公开
    用于在真空系统中使用的半导体制造气体再循环流控制方法和装置

    公开(公告)号:EP1243667A2

    公开(公告)日:2002-09-25

    申请号:EP02006584.3

    申请日:2002-03-21

    IPC分类号: C23C16/50 H01L21/00

    摘要: A gas recirculation flow control method and apparatus for use in an evacuation system having a vacuum chamber into which a gas is introduced, a first vacuum pump for exhausting the gas from the vacuum chamber and reducing the pressure in the vacuum chamber to a desired pressure, a second vacuum pump for performing evacuation to lower the back pressure of the first vacuum pump below an allowable back pressure, and a gas recirculation line for returning a part of gas exhausted from the first vacuum pump to the vacuum chamber. The recirculation flow rate Q 2 of the gas returning to the vacuum chamber through the gas recirculation line is controlled by adjusting the differential pressure Pd-Pc in the gas recirculation line by varying the effective pumping speed of the second vacuum pump using the following relationship: Q 2 =C×(Pd-Pc)    where: Q 2 denotes the recirclllation flow rate of the gas returning to the vacuum chamber through the gas recirculation line; Pc denotes the pressure in the vacuum chamber; Pd denotes the pressure in the upstream side of the gas recirculation line; and C denotes the conductance of the gas recirculation line.

    摘要翻译: 用于在排气系统具有真空室,其一个气体引入中使用的气体再循环流控制方法和装置,一第一真空泵,用于从真空腔室排出该气体和还原在该真空室中的压力至所需压力, 第二真空泵,用于执行抽真空,以降低所述第一真空泵的下面到允许背压背压,以及用于返回从所述第一真空泵到真空室排出的气体的一部分的气体再循环管线。 气体通过气体再循环管线返回到真空腔室的再循环流量Q2是通过使用下面的关系改变第二真空泵的有效排气速度调整差动压力Pd-PC在气体再循环管线控制:< DF> Q2 = CX(PD-PC)其中:Q2表示气体通过气体再循环管线返回到真空室的recirclllation流速; PC表示在真空室中的压力; 的Pd表示在气体再循环管线的上游侧的压力; 和C表示气体再循环管线的电导。