公开(公告)号：EP0842409B1

公开(公告)日：2001-02-21

申请号：EP96925778.1

申请日：1996-07-12

申请人： ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)

发明人： MAZUET, Denis ,  BERTRAND, Patrick ,  PHAN, Do, Quyen ,  MOHR, Werner

IPC分类号： G01M11/02

CPC分类号： G01M11/0257 ,  G01M11/0271

公开(公告)号：EP1920291A2

公开(公告)日：2008-05-14

申请号：EP06809230.3

申请日：2006-08-01

申请人： ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)

发明人： ALLIONE, Pascal ,  LE SAUX, Gilles ,  CHAUVEAU, Jean-Pierre ,  MAZUET, Denis

IPC分类号： G02C7/02 ,  G02B3/10 ,  G02B3/00

CPC分类号： G06F17/50 ,  B29D11/00009 ,  B29D11/00971 ,  G02B3/0081 ,  G02B3/10 ,  G02C7/028 ,  G02C7/061 ,  G02C2202/08

摘要： The invention relates to a method of manufacturing an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method comprising: - a calculation step (CAL), in which the second equation EF2 is calculated from the function OF, and the first equation EF1; - a first manufacturing step (M1), in which a semi-finished optical system (SFOS) comprising the first part (F1) is manufactured so as to obtain a manufactured semi-finished optical system (MSFOS); and - a second manufacturing step (M2), in which the manufactured semi-finished optical system (MSFOS) is manufactured so as to be further provided with a second part (F2) defined by the second equation (EF2) and to obtain the optical system (OS).

公开(公告)号：EP0842409A1

公开(公告)日：1998-05-20

申请号：EP96925778.0

申请日：1996-07-12

申请人： ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)

发明人： MAZUET, Denis ,  BERTRAND, Patrick ,  PHAN, Do, Quyen ,  MOHR, Werner

IPC分类号： G01M11

CPC分类号： G01M11/0257 ,  G01M11/0271

摘要： A fringe deflectometry apparatus including lighting means (1, 2, 3, 4, 5, 6, 7, 8) for illuminating an optical component to be measured using radiation having a known wavefront; deflectometric means (14) for measuring the deflection of the radiation after it has been reflected or transmitted by said optical component to be measured; and means (25, 26) for materialising a reference beam. The apparatus further includes means (27) for measuring the transverse aberration of the reference beam after it has been reflected or transmitted by said optical component to be measured. A deflectometry method using such an apparatus enables an absolute phase reference to be provided.

摘要翻译： 一种条纹偏转测量装置，包括：照明装置（1,2,3,4,5,6,7,8），用于使用具有已知波前的辐射照射待测量的光学部件; 用于测量辐射在被所述待测光学部件反射或透射之后的偏转的偏转装置（14） 和用于实现参考光束的装置（25,26）。 该设备还包括用于在参考光束已被所述待测光学元件反射或透射之后测量其横向像差的装置（27）。 使用这种装置的偏转法可以提供绝对的相位参考。