公开(公告)号：EP0880369A2

公开(公告)日：1998-12-02

申请号：EP97903906.0

申请日：1997-01-22

申请人： ETEX CORPORATION

发明人： LEE, Dosuk, D. ,  NAGRAS, Atul

IPC分类号： A61L27 ,  A61F2 ,  C23C8 ,  C23F4

CPC分类号： C23C8/36 ,  A61F2/30767 ,  A61F2/3094 ,  A61F2002/3092 ,  A61F2002/30925 ,  A61F2310/00023 ,  A61F2310/00796 ,  A61L27/04 ,  A61L27/06 ,  A61L27/32 ,  A61L27/50 ,  A61L27/56 ,  C23F4/00

摘要： A method of obtaining a porous titanium surface suitable for medical implants is provided. The titanium surface is exposed to a plasma comprising a reactive plasma gas, the reactive plasma gas comprising an active etching species and a sputtering gas. The plasma conditions are effective to modify the titanium surface and provide surface porosity. The plasma conditions are effective to non-uniformly etch and sputter the titanium surface.