摘要:
Disclosed are a sealed cobalt leaching device, a reagent for the cobalt leaching, a method using the device, and use of the method. The sealed cobalt leaching device includes a base, where a top of the base is provided with a first groove; a chemical solution holding tool is provided above the base; a bottom of the chemical solution holding tool is removably connected to the base; a holding through-hole penetrating up and down is formed inside the chemical solution holding tool; and a sealing cover is provided above the chemical solution holding tool. Beneficial effects of the present disclosure: Through the combination of the base, the chemical solution holding tool, and the sealing cover, the holding through-hole inside the chemical solution holding tool is sealed, thereby improving the cobalt leaching temperature and the cobalt leaching efficiency. Moreover, a polycrystalline diamond compact (PDC) is placed in the first groove, such that only a diamond layer of the PDC is in contact with a cobalt leaching reagent, thereby effectively protecting a metal alloy substrate and preventing environmental pollution and human body damage.
摘要:
The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.
摘要:
The present invention relates to a process for cleaning chambers of apparatus used for semiconductor manufacturing with a gas mixture comprising or consisting of fluorine, nitrogen and argon as well as said gas mixtures.
摘要:
The present invention relates to a method for treating an outer surface (2) of a heat transfer fluid tube (1) especially for a receiver of a solar thermal power plant, comprising the steps: of providing the heat transfer fluid tube (1) and treating the outer surface (2) with a hydrogen plasma jet (3) so that a porosity in the range of a nano-scale is created in a thin layer of that outer surface (2).