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    PROCÉDÉ ET SYSTÈME POUR CONTRÔLER DES FLUX D'IONS DANS UN PLASMA RF
    1.
    发明公开
    PROCÉDÉ ET SYSTÈME POUR CONTRÔLER DES FLUX D'IONS DANS UN PLASMA RF 审中-公开
    VERFAHREN UND系统ZUR STEUERUNG EINES IONENFLUSSES IN EINEM RF-PLASMA

    公开(公告)号：EP3138116A1

    公开(公告)日：2017-03-08

    申请号：EP15725891.4

    申请日：2015-04-30

    申请人： Ecole Polytechnique

    发明人： BRUNEAU, Bastien ,  JOHNSON, Erik ,  NOVIKOVA, Tatiana ,  BOOTH, Jean-Paul

    IPC分类号： H01J37/32

    摘要： A method for generating an ion flux asymmetry in a capacitively coupled radiofrequency plasma reactor (4) comprises a step of exciting a first electrode (24) with a radiofrequency voltage waveform. The normalized voltage waveform is a waveform approximated, with a degree of approximation, by a normalized sawtooth wave radiofrequency function having different up and down slopes. The degree of approximation of the approximate waveform and the pressure P of the gas (6) are sufficiently high to cause an ion flux asymmetry to appear between the ion flux at the first electrode and the ion flux at a second electrode (26).

    摘要翻译： 气体的近似波形和压力P的近似程度足够高，导致在第一电极处的离子流和第二电极处的离子流之间的离子流的不对称性的出现。