Beam illumination system and method for producing printing plates
    1.
    发明公开
    Beam illumination system and method for producing printing plates 有权
    Belichtungssystem und Verfahren zur Herstellung von Druckformen

    公开(公告)号:EP1674931A2

    公开(公告)日:2006-06-28

    申请号:EP05027152.7

    申请日:2005-12-13

    申请人: Esko-Graphics A/S

    发明人: Sievers, Wolfgang

    IPC分类号: G03F7/20 B41C1/10

    摘要: Images are transferred to printing plates by illuminating light-responsive materials with patterns corresponding to the images to be printed. The present invention provides for the transferring of an image by the combined flux from two or more beams of light. Particular embodiments ablate the mask printing plates for CTP systems by the combined illumination from a first, broad beam and a plurality of controllable, pulsed beams that co-illuminate the plate with the first beam. The resulting system and method is less expensive than the prior art and produces a printing plate more efficiently and with improved productivity than the prior art.

    摘要翻译: 通过用与要打印的图像对应的图案照亮光响应材料将图像转印到印版上。 本发明提供了通过来自两个或更多束光束的组合通量传递图像的方法。 特定实施例通过来自第一宽梁和多个可控的脉冲光束的组合照明来消除用于CTP系统的掩模印刷板,所述光束使板与第一光束共同照射。 所得到的系统和方法比现有技术便宜,并且比现有技术更有效地并且提高生产率产生印刷版。

    Method and apparatus for multi-track imaging using single-mode beams and diffraction-limited optics
    2.
    发明公开
    Method and apparatus for multi-track imaging using single-mode beams and diffraction-limited optics 有权
    采用单模光束和衍射受限光学器件的方法和装置的多成像

    公开(公告)号:EP1480441A1

    公开(公告)日:2004-11-24

    申请号:EP04076432.6

    申请日:2004-05-14

    申请人: Esko-Graphics A/S

    发明人: Sievers, Wolfgang

    IPC分类号: H04N1/191 G02B26/12

    摘要: A method and apparatus that provide multichannel imaging and that allow using diffraction-limited optics. The imaging apparatus includes a laser beam source to generate single-mode laser beam of energy, a multichannel spatial light modulator (SLM) accepting a plurality of modulating signals, and a beam multiplier between the radiation source and the SLM. The beam multiplier accepts the beam generated by the source and generates from that beam a plurality of beams directed onto the SLM. The beams from the beam multiplier illuminate the active region of the SLM such that the SLM generates a plurality of modulated beams modulated according to the modulating signals. The apparatus further includes an optical subsystem located between the SLM and an imaging plane that includes at least one optical element to focus the modulated beams onto an imaging plane. A recording medium sensitive to imaging radiation from the source is placed at the imaging plane. The recording medium is capable of being permanently marked in response to incidence of such imaging radiation. The beams generated by the SLM are each substantially a single-mode beam such that the first optical subsystem may be designed using diffraction-limited optics.

    摘要翻译: 一种方法和装置确实提供多通道成像,也允许使用衍射限制的光学系统。 该成像设备包括一个激光束源产生能量的单模激光束,多声道空间光调制器(SLM)接受调制信号的多个,并且辐射源和SLM之间的光束多路器。 光束多路器接受由从光束确实引导到SLM束的多个源和基因率所产生的光束。 从光束多路器的光束照亮SLM的有源区检查做了SLM基因率调制gemäß到调制信号调制的光束的复数。 该装置包括在位于SLM之间并于成像平面另外光学子系统确实包括对所述调制的束聚焦到射在成象平面上的至少一个光学元件。 一种记录从源成像辐射敏感介质在成像平面被放置。 该记录介质能够被永久标记响应于辐射寻求成像的发生率。 由SLM生成的光束各自基本上检查单模光束做的第一光学子系统可以使用衍射限制的光学系统进行设计。

    Beam illumination system and method for producing printing plates
    3.
    发明公开
    Beam illumination system and method for producing printing plates 有权
    曝光系统和方法用于制造印刷版的

    公开(公告)号:EP1674931A3

    公开(公告)日:2009-08-05

    申请号:EP05027152.7

    申请日:2005-12-13

    申请人: Esko-Graphics A/S

    发明人: Sievers, Wolfgang

    IPC分类号: G03F7/20 B41C1/10

    摘要: Images are transferred to printing plates by illuminating light-responsive materials with patterns corresponding to the images to be printed. The present invention provides for the transferring of an image by the combined flux from two or more beams of light. Particular embodiments ablate the mask printing plates for CTP systems by the combined illumination from a first, broad beam and a plurality of controllable, pulsed beams that co-illuminate the plate with the first beam. The resulting system and method is less expensive than the prior art and produces a printing plate more efficiently and with improved productivity than the prior art.

    Stitching prevention in multibeam imaging for exposing printing plates
    4.
    发明公开
    Stitching prevention in multibeam imaging for exposing printing plates 有权
    在多光束曝光法的印版成像无缝

    公开(公告)号:EP1674930A3

    公开(公告)日:2009-08-05

    申请号:EP05027151.9

    申请日:2005-12-13

    申请人: Esko-Graphics A/S

    IPC分类号: G03F7/20

    摘要: A method of exposing imaging data (542) onto a sensitized medium (550) including exposing K sets (380, 480) of N of tracks (1, 2, 3, 4) onto the medium according to a corresponding part of imaging data, each successive set being a pixel distance apart in a fast scan direction (301, 401). The method further includes exposing L sets (390, 490) of N tracks onto the medium with an offset of M pixels in a slow scan direction (302, 402) substantially perpendicular to the fast scan direction, according to a second corresponding part of imaging data. The method includes repeating alternately exposing K sets and L sets of N tracks until the complete medium is exposed along the fast scan direction. During or after the alternately exposing K sets and L sets, there is progression in the slow scan direction such that after exposing the complete length of N tracks of exposed pixels, the next N tracks match along the medium at the start of the next N tracks.

    Stitching prevention in multibeam imaging for exposing printing plates
    5.
    发明公开
    Stitching prevention in multibeam imaging for exposing printing plates 有权
    Nahtlose Belichtung von Druckformen in Mehrstrahlbelichtungsverfahren

    公开(公告)号:EP1674930A2

    公开(公告)日:2006-06-28

    申请号:EP05027151.9

    申请日:2005-12-13

    申请人: Esko-Graphics A/S

    IPC分类号: G03F7/20

    摘要: A method of exposing imaging data (542) onto a sensitized medium (550) including exposing K sets (380, 480) of N of tracks (1, 2, 3, 4) onto the medium according to a corresponding part of imaging data, each successive set being a pixel distance apart in a fast scan direction (301, 401). The method further includes exposing L sets (390, 490) of N tracks onto the medium with an offset of M pixels in a slow scan direction (302, 402) substantially perpendicular to the fast scan direction, according to a second corresponding part of imaging data. The method includes repeating alternately exposing K sets and L sets of N tracks until the complete medium is exposed along the fast scan direction. During or after the alternately exposing K sets and L sets, there is progression in the slow scan direction such that after exposing the complete length of N tracks of exposed pixels, the next N tracks match along the medium at the start of the next N tracks.

    摘要翻译: 一种将成像数据(542)曝光到敏化介质(550)上的方法,包括根据成像数据的相应部分将轨道(1,2,3,4)N个的K组(380,480)曝光到介质上, 每个连续的组是在快速扫描方向(301,401)上分开的像素距离。 该方法还包括根据成像的第二对应部分,将基于垂直于快速扫描方向的慢扫描方向(302,402)的N个轨迹的L组(390,490)曝光到具有M个像素的偏移的介质上 数据。 该方法包括重复地交替地暴露K组和L组N个磁道,直到完整的介质沿着快速扫描方向曝光。 在交替曝光K组和L组之间或之后,在慢扫描方向上有进展,使得在暴露出曝光像素的N个磁迹的完整长度之后,下一个N个磁道在下一个N个磁迹的开始处沿着介质匹配 。