公开(公告)号：EP3906995A1

公开(公告)日：2021-11-10

申请号：EP20172717.9

申请日：2020-05-04

申请人： FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. ,  Centre National de la Recherche Scientifique ,  MOF Technologies Limited ,  Graphenea, S.A. ,  Université de Mons

发明人： HEYMANS, Nicolas ,  DE WEIRELD, Guy ,  CASABAN-JULIAN, Jose ,  HAMILL, Conor ,  ZHANG, Yuancheng ,  MOORE, Ashleigh ,  EMMERICH, Rudolf ,  GRAF, Matthias ,  RESS, Christian ,  SCHÖNWALD, Markus ,  TORIBIO, Beatriz Alonso ,  ZURUTUZA, Amaia ,  ORTEGA, Amaya ,  SERRE, Christian

IPC分类号： B01J20/22 ,  B01J20/20 ,  B01J20/30 ,  B01J20/34 ,  B01D53/04

摘要： The invention relates to a method of preparing an adsorbent material on the basis of a porous metal-organic framework (MOF) being suitable for adsorbing gases, in particular carbon dioxide (CO 2 ), comprising the steps of
(a) providing at least one porous metal-organic framework in particulate form;
(b) providing graphene oxide (GO) in particulate form; and
(c) combining the at least one porous particulate metal-organic framework with the particulate graphene oxide to obtain the adsorbent material.
Moreover, the invention relates to an adsorbent material of the type as mentioned above as well as to the use of said adsorbent material in an adsorption process, in which the adsorbent material is exposed to a gas stream so as to adsorb a gas component of the gas stream, and in which the gas component is desorbed by heating the adsorbent material by means of exposing it to high-frequency electromagnetic radiation for regeneration.

公开(公告)号：EP2268382A2

公开(公告)日：2011-01-05

申请号：EP09733995.6

申请日：2009-04-22

申请人： Université de Mons ,  CNRS Centre National De La Recherche Scientifique

发明人： DE WEIRELD, Guy ,  HAMON, Lomig ,  SERRE, Christian ,  DEVIC, Thomas ,  FEREY, Gérard ,  LOISEAU, Thierry

IPC分类号： B01D53/02 ,  B01J20/26

CPC分类号： B01D53/02 ,  B01D2253/204 ,  B01D2257/30 ,  B01D2257/304 ,  B01J20/226

摘要： The invention relates to a method for separating a sulphur compound from a gas mixture. It comprises contacting said gas mixture with an adsorbent which comprises a metal-organic framework (MOF) comprising a tridimensional succession of motifs having the formula: M
m O
k X
L p wherein, inter alia, M is a metal ion selected from the group consisting of Ti
4+ , V
4+ , Zr
4+ , Mn
4+ , Si
4+ , Al
3+ , Cr
3+ , V
3+ , Ga
3+ , In
3+ , Mn
3+ , Mn
2+ and Mg
2+ , L is a spacer ligand comprising a radical comprising one or more carboxylate groups.