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公开(公告)号：EP0780730A2
公开(公告)日：1997-06-25
申请号：EP96120207.4
申请日：1996-12-16
发明人： Maemoto, Kazuo , Kawabe, Yasumasa
CPC分类号： G03F7/0226
摘要： A positive-type light-sensitive lithographic printing plate comprising a grained and anodized aluminum plate having formed on the surface thereof a layer of a light-sensitive composition containing a) an o-naphthoquinonediazide compound, b) an alkaline water-soluble and water-insoluble resin, c) a compound which generates an acid by light, d) a blue dye the tone of which is changed with an acid, and e) a yellow dye having a specific structure and the absorbance of which at 417 nm is at least 70% of the absorbance at 436 nm.
The light-sensitive lithographic printing plate has a high sensitivity and, wherein unnecessary images of the edge portions of film are difficult to form on the plate at the reproduction of dots, the image-visibility after exposure and the suitability for plate inspection after development are good, and register marks are easy to see.摘要翻译： 一种正型感光平版印刷版，其包括在其表面上形成含有a）邻萘醌二叠氮化合物的感光性组合物的颗粒和阳极氧化铝板，b）碱性水溶性和水溶性的， 不溶性树脂，c）通过光产生酸的化合物，d）色调随酸变化的蓝色染料，e）具有特定结构的黄色染料，其吸光度在417nm处至少为 在436nm的吸光度的70％。 感光平版印刷版具有高灵敏度，并且在再现点处难以在印版上形成膜的边缘部分的不需要的图像，曝光后的图像可视性和显影后的板检查的适用性是 好的，注册标记很容易看到。
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公开(公告)号：EP0886183A1
公开(公告)日：1998-12-23
申请号：EP98114167.4
申请日：1994-12-16
IPC分类号： G03F7/022
CPC分类号： G03F7/022
摘要： A positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound, said ionization-sensitive radioactive compound comprises a mixture of a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenolic hydroxyl groups as an ionization-sensitive radioactive compound (B) in an amount of 30 % or more by weight based on the total amount of said ionization-sensitive radioactive compound.
摘要翻译： 一种正性光致抗蚀剂组合物，其包含水不溶性碱溶性树脂，水不溶性碱溶性低分子化合物和电离敏感性放射性化合物，所述电离敏感性放射性化合物包括：萘醌二叠氮化物二 具有三个酚羟基作为电离敏感性放射性化合物（A）的水不溶性碱溶性低分子化合物和具有四个酚羟基作为电离敏感放射性的水不溶性碱溶性低分子化合物的萘醌二叠氮化物二酯 化合物（B）的含量相对于所述电离敏感性放射性化合物的总量为30重量％以上。
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公开(公告)号：EP0952489A1
公开(公告)日：1999-10-27
申请号：EP99107339.6
申请日：1999-04-21
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
摘要翻译： 本发明提供一种正型感光性树脂组合物，其包含（A）具有脂环式烃骨架的聚合物，在酸的作用下分解成可溶于碱的物质，（B）在光化射线照射时产生酸的化合物，（C ）含氮碱性化合物，（D）含氟表面活性剂和含硅表面活性剂中的至少一种和（E）溶剂。 当溶剂（E）是特定溶剂的组合时，组合物可以表现出更好的特性。
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公开(公告)号：EP0780730B1
公开(公告)日：2002-08-21
申请号：EP96120207.4
申请日：1996-12-16
发明人： Maemoto, Kazuo , Kawabe, Yasumasa
CPC分类号： G03F7/0226
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公开(公告)号：EP0385442A1
公开(公告)日：1990-09-05
申请号：EP90103909.9
申请日：1990-02-28
CPC分类号： G03F7/091
摘要： A positive-working photoresist composition is disclosed comprising an alkali-soluble resin and a 1,2-naphthoquinonediazo group-containing compound, and further contains at least one light absorber selected from the group consisting of the azo compounds represented by the following formulae (I), (II), (III), (IV), (V) and (VI) in a proportion of from about 0.1 to about 10% by weight based on the total solid content of the photoresist composition, and is useful for forming a fine pattern of excellent quality even on a substrate with unevenness or high reflectivity:
wherein R₁ represents a hydrogen atom or a lower alkyl group; and X represents a sulfur atom or an oxygen atom;
wherein R₂ represents a hydroxyl group or a di(lower alkyl)amino group; R₃ and R₄ each represents a hydrogen atom or a carboxyl group, provided that at least one of R₃ and R₄ represents a carboxyl group; and R₅ represents a hydrogen atom, a hydroxyl group or a nitro group;
wherein R₆ and R₇ each represents a hydrogen atom, a lower alkyl group or a nitro group; R₈ represents a hydrogen atom, a hydroxyl group or an amino group; R₉ and R₁₀ each represents a hydrogen atom, an amino group, a lower alkyl group, a nitro group or an acylamino group;
wherein R₁₁ and R₁₂ each represents a lower alkyl group or a nitro group, provided that at least one of R₁₁ and R₁₂ represents a nitro group;
wherein R₁₃ and R₁₄ each represents a hydrogen atom, a hydroxyl group, a nitro group or a lower alkyl group, provided that at least one of R₁₃ and R₁₄ represents a hydroxyl group; and
wherein R₁₅ and R₁₆ each represents a hydrogen atom or a hydroxyl group, provided that at least one of R₁₅ and R₁₆ represents a hydroxyl group.摘要翻译： 公开了一种正性光致抗蚀剂组合物，其包含碱溶性树脂和含1,2-萘醌二叠氮基的化合物，并且还含有至少一种选自由下式（I）表示的偶氮化合物的光吸收剂 ），（II），（III），（IV），（V）和（VI）以相对于光致抗蚀剂组合物的总固体含量为约0.1至约10重量％的比例， 即使在具有不均匀性或高反射率的基板上也具有优异品质的精细图案：
其中R1表示氢原子或低级烷基; X表示硫原子或氧原子; 其中R2表示羟基或二（低级烷基）氨基; R 3和R 4各自表示氢原子或羧基，条件是R 3和R 4中的至少一个表示羧基; R5表示氢原子，羟基或硝基; 其中R6和R7各自表示氢原子，低级烷基或硝基; R8表示氢原子，羟基或氨基; R9和R10各自表示氢原子，氨基，低级烷基，硝基或酰氨基; 其中R11和R12各自表示低级烷基或硝基，条件是R11和R12中的至少一个表示硝基; 其中R 13和R 14各自表示氢原子，羟基，硝基或低级烷基，条件是R 13和R 14中的至少一个表示羟基; 和 ，其中R 15和R 16各自表示氢原子或羟基，条件是R 15和R 16中的至少一个表示羟基。
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