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1.发明公开
公开(公告)号：EP3590976A1
公开(公告)日：2020-01-08
申请号：EP18760793.2
申请日：2018-02-27
申请人： Fujifilm Corporation
发明人： ISHIJI Yohei , NOGOSHI Keisuke
IPC分类号： C08F2/50 , B41C1/00 , C08F290/06 , C08L101/00 , G03F7/00 , G03F7/004 , G03F7/029
摘要： Provided is a curable composition which includes a salt compound comprising (A) an organic anion in which a negative charge is present on an aluminium atom or a phosphorus atom, and (B) a counter cation. The curable composition exhibits excellent heat stability over time, and is cured excellently as a result of being irradiated with light. Also provided are: a lithographic printing plate precursor which exhibits excellent heat stability over time, and excellent on-press developability, and with which a lithographic printing plate having excellent printing durability can be prepared; a lithographic printing plate precursor which exhibits excellent heat stability over time, and excellent plate inspection properties and on-press developability, and with which a lithographic printing plate exhibiting excellent printing durability can be prepared; and a method for preparing a lithographic printing plate which uses the lithographic printing plate precursor.
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公开(公告)号：EP4372018A1
公开(公告)日：2024-05-22
申请号：EP22842107.9
申请日：2022-07-12
申请人： FUJIFILM Corporation
IPC分类号： C08F220/46 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20
CPC分类号： G03F7/039 , G03F7/038 , G03F7/004 , G03F7/20 , C08F220/46
摘要： An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a pattern having little variation in the line width even if the time from the end of exposure treatment to the start of development treatment (waiting time before development) varies. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention satisfies a predetermined requirement X or Y.-
公开(公告)号：EP4372014A1
公开(公告)日：2024-05-22
申请号：EP22842080.8
申请日：2022-07-11
申请人： FUJIFILM Corporation
摘要： The present invention provides a pattern forming method that enables the formation of a pattern excellent in resolution and evenness and a method for producing an electronic device. The pattern forming method according to the present invention includes a resist film-forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive resin composition that undergoes an increase in the degree of solubility in an organic solvent due to action of exposure, acid, base, or heating, an exposure step of exposing the resist film, and a developing step of developing the exposed resist film with a developer including an organic solvent. The organic solvent includes an ester-based solvent having 6 or less carbon atoms and a hydrocarbon-based solvent.
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4.发明公开
公开(公告)号：EP3590975A1
公开(公告)日：2020-01-08
申请号：EP18761904.4
申请日：2018-02-27
申请人： FUJIFILM Corporation
发明人： ISHIJI Yohei , NOGOSHI Keisuke , ENOMOTO Kazuaki , MIYAGAWA Yuuya
摘要： Provided are: a curable composition including a salt compound provided with a) an organic anion of which the values of the Hansen solubility parameters δd, δp, and δH are respectively 16 or higher, in the range of 16-32 inclusive, and not more than 60% of δp, and b) a counter cation; a lithographic printing plate precursor provided with an image recording layer including the curable composition; a method for preparing a lithographic printing plate which uses the lithographic printing plate precursor; and a compound which is used in the image recording layer of the lithographic printing plate precursor.
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