摘要:
A gas supply equipment comprising a gas control valve (2), an orifice accommodating valve (9) provided downstream of the control valve (2), a pressure detector (3) provided between the control valve (2) and the orifice accommodating valve (9), an orifice (5) provided downstream of the valve mechanism of the orifice accommodating (9) and an arithmetic and control unit which calculates a flow rate as Qc = KP1 (K; constant) from a detected pressure P1 by the pressure detector (3) and outputs to the drive unit of the control valve (2) the difference between a flow rate instruction signal Qs and a calculated flow rate Qc as a control signal Qy.
摘要:
An improved and reduced-size low-cost gas supply system equipped with a pressure-type flow control used as in semiconductor manufacturing facilities. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, raising the flow rate control accuracy and reliability of facilities. That eliminates the quality ununiformity of products or semiconductors and raises the production efficiency. To illustrate, the gas supply system equipped with a pressure-type flow control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc = KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.
摘要:
A cost reduction can be achieved by making a differential pressure type flowmeter simple in structure, and highly accurate flow rate measurements can be attained over the wide flow rate range of 100%-1 % with errors E of less than 1 (%SP) both in real time and in a state of inline. To achieve the ends, a differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P 1 on the upstream side of an orifice, a detector to detect a fluid pressure P 2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P 1 , pressure P 2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1 · P1/√T· ((P 2 /P 1 ) m - (P 2 /P 1 ) n ) ½ (where C 1 is a proportional constant, and m and n are constants).