GAS SUPPLY EQUIPMENT WITH PRESSURE TYPE FLOW RATE CONTROL DEVICE
    2.
    发明公开
    GAS SUPPLY EQUIPMENT WITH PRESSURE TYPE FLOW RATE CONTROL DEVICE 有权
    GASVERSORGUNGSEINRICHTUNG MITDRUCKABHÄNGIGERDURCHFLUSSREGLUNGSVORRICHTUNG

    公开(公告)号:EP1001326A1

    公开(公告)日:2000-05-17

    申请号:EP99922553.5

    申请日:1999-05-27

    IPC分类号: G05D7/06

    摘要: An improved and reduced-size low-cost gas supply system equipped with a pressure-type flow control used as in semiconductor manufacturing facilities. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, raising the flow rate control accuracy and reliability of facilities. That eliminates the quality ununiformity of products or semiconductors and raises the production efficiency.
    To illustrate, the gas supply system equipped with a pressure-type flow control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc = KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.

    摘要翻译: 一种改进且尺寸较小的低成本气体供应系统,配备有与半导体制造设备一样使用的压力型流量控制。 提高瞬态流量特性,防止气体开始时气体过冲,提高流量控制精度和设施可靠性。 这消除了产品或半导体的质量不均匀性并提高了生产效率。 为了说明,配置有压力型流量控制单元的气体供给系统被构造成使得在孔口的上游侧的压力保持为比下游压力高大约两倍或更多的气体,气体流量被控制以供应 气体通过孔口相关阀进入气体使用过程,所述气体供应系统包括用于接收来自气体供应源的气体的控制阀,设置在控制阀的下游侧的孔附件阀,设置有压力检测器 在控制阀和节流阀相关阀之间,设置在节流阀相关阀的阀机构的下游侧的孔口和计算控制单元,其中基于由压力检测器检测到的压力P1,流量 用公式Qc = KP1(K:常数)计算Qc,然后输入流量指定信号Qs和计算流量Qc之间的差作为控制符号 在控制阀的驱动中,由此调节用于调节压力P1的控制阀的打开,从而可以控制供给气体的流量。

    DIFFERENTIAL PRESSURE TYPE FLOWMETER AND DIFFERENTIAL PRESSURE TYPE FLOWMETER CONTROLLER
    3.
    发明公开
    DIFFERENTIAL PRESSURE TYPE FLOWMETER AND DIFFERENTIAL PRESSURE TYPE FLOWMETER CONTROLLER 审中-公开
    STRÖMUNGSMESSERDES DIFFERENZDRUCKTYPS UNDSTRÖMUNGSMESSERSTEUERUNGDES DIFFERENZDRUCKTYPS

    公开(公告)号:EP1643218A1

    公开(公告)日:2006-04-05

    申请号:EP04746098.5

    申请日:2004-06-18

    IPC分类号: G01F1/42 G01F1/50 G01F7/00

    CPC分类号: G01F1/50 G01F1/42 G05D7/0635

    摘要: A cost reduction can be achieved by making a differential pressure type flowmeter simple in structure, and highly accurate flow rate measurements can be attained over the wide flow rate range of 100%-1 % with errors E of less than 1 (%SP) both in real time and in a state of inline.
    To achieve the ends, a differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P 1 on the upstream side of an orifice, a detector to detect a fluid pressure P 2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P 1 , pressure P 2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1 · P1/√T· ((P 2 /P 1 ) m - (P 2 /P 1 ) n ) ½ (where C 1 is a proportional constant, and m and n are constants).

    摘要翻译: 通过使差压式流量计结构简单,可以实现成本降低,并且可以在100%-1%的宽流量范围内实现高精度的流量测量,误差E小于1(%SP) 在实时和处于内联状态。 为了达到目的,差压式流量计包括孔口,用于检测孔口上游侧的流体压力P 1的检测器,检测孔口下游侧的流体压力P 2的检测器,检测器 以检测孔口上游侧的流体温度T;以及控制运算电路,通过使用利用上述检测器检测出的压力P 1,压力P 2和温度T来计算通过孔口的流体流量Q,以及 上述流体的流量Q用等式Q = C1·P1 /šT·((P 2 / P 1)m - (P 2 / P 1)n)1/2来计算,其中C 1是比例常数,m 和n是常数)。