FLOW CONTROL METHOD FOR CLUSTERING FLUID AND FLOW CONTROL DEVICE FOR CLUSTERING FLUID
    3.
    发明公开
    FLOW CONTROL METHOD FOR CLUSTERING FLUID AND FLOW CONTROL DEVICE FOR CLUSTERING FLUID 审中-公开
    FLUSSSTEUERVERFAHREN ZUR FLUIDCLUSTERUNG UND FLUSSSTEUEREINRICHTUNG ZUR FLUIDCLUSTERUNG

    公开(公告)号:EP1585002A4

    公开(公告)日:2006-04-26

    申请号:EP04702837

    申请日:2004-01-16

    IPC分类号: G05D7/06 H01L21/00 H01L21/306

    摘要: A pressure-type flow control device is used to permit a high-accuracy control of the flow rate of a clustering fluid such as HF gas to be supplied to a vacuum chamber or the like within a flow rate range of about 3-300 SCCM. Specifically, a method of controlling the flow rate of a clustering fluid that uses a pressure-type flow control device where a flow rate Q of a gas flowing through an orifice is computed as Q=KP1 (K is constant) with a ratio P2/P1 between an orifice-upstream-side gas pressure P1 and a downstream-side gas pressure P2 kept up to the critical pressure ratio of the gas, wherein the pressure-type flow control device is heated to at least 40°C, or the clustering fluid is added with a dilute gas to be kept at up to a partial pressure, thereby allowing the clustering fluid, produced by dissociating the association of molecules and then keeping them in a monomolecular state, to flow through the orifice.

    摘要翻译: 使用压力式流量控制装置,可以在3×300SCCM的流量范围内对供应到真空室等的HF气体等聚集流体进行高精度流量控制。 具体地说,本文公开了使用压力型流量控制装置来控制聚集流体的流量的方法,其中通过孔口的气体的流量Q被计算为K = KP1(其中K 是常数),气体处于孔口上游侧的气体压力P1与孔口下游侧的气体压力P2之间的比P2 / P1保持在不高于 通过将上述压力式流量控制装置加热至高于40℃的温度,或者通过将稀释气体施加到聚集流体以使其低于 分压使得聚簇流体被允许以单分子状态通过上述孔口。

    DEVICE FOR CONTROLLING CHAMBER INNER PRESSURE AND INNER PRESSURE CONTROLLED-TYPE CHAMBER
    4.
    发明公开
    DEVICE FOR CONTROLLING CHAMBER INNER PRESSURE AND INNER PRESSURE CONTROLLED-TYPE CHAMBER 审中-公开
    一种用于控制腔内部压力和室内压控制型

    公开(公告)号:EP1672457A4

    公开(公告)日:2008-02-13

    申请号:EP04817112

    申请日:2004-09-14

    IPC分类号: G05D7/06 G05D16/20

    摘要: Flow rate control accuracy is prevented from being reduced in a low flow rate region to enable highly accurate flow rate control over the entire flow rate control region. By this, a chamber inner pressure is highly accurately controlled over a wide range by regulating the flow rate of a gas fed to a chamber. A gas feeding device for feeding a gas to a chamber, where the device is constituted of parallelly connected pressure-type flow rate control devices and a control device for controlling the flow rate control devices and feeds a desired gas, while controlling the flow rate, to a chamber deaerated by a vacuum pump. The gas feeding device is constructed such that one of the pressure-type flow control devices controls a gas flow rate range of up to 10% maximum of the maximum flow rate fed to the chamber and the remaining flow control devices control the remaining range. Further, a pressure detector is installed on a chamber and a detected value from the detector is inputted in the control device. Control signals to the pressure-type flow rate control devices are regulated to control the amount of the gas fed to the chamber, controlling a chamber inner pressure.