专利检索 ap:("FUSION SYSTEMS CORPORATION") AND inv:"HUFFMAN, Maria" 第 1 页

1.

发明公开
FLUORINE ASSISTED STRIPPING AND RESIDUE REMOVAL IN SAPPHIRE DOWNSTREAM PLASMA ASHER 失效
标题翻译：福陆公司在STUTZTES剥离和RUCKSTANDBESEITUNG在电力ABWARTS PLASMA薇拉·希尔FROM SAPHIR

公开(公告)号：EP0868836A1

公开(公告)日：1998-10-07

申请号：EP97944360.0

申请日：1997-09-24

申请人： FUSION SYSTEMS CORPORATION

发明人： HUFFMAN, Maria , SAKTHIVEL, Palanikumaran , ZIMMERMAN, Teresa , NOBLE, Thomas

IPC分类号： C23F4 , H01J37 , H01L21 , H05H1

CPC分类号： H01J37/32192 , H01J37/32357 , H01J2237/3342 , H01L21/02071 , H01L21/31116 , H05H1/46

摘要： A method for removing material from a substrate. A plasma is generated in a plasma generating and discharge device including a sapphire plasma tube (40). At least one fluorine-containing compound is introduced into the plasma. A forming gas is introduced into the plasma. The plasma is directed toward the material to be removed from the substrate (88).