摘要:
A photovoltaic apparatus (200) is provided including a back sheet (210) and a photovoltaic device (100) disposed over the back sheet. The photovoltaic device includes an array of photovoltaic cells (101-104) extending in a first direction; and a plurality of serial interconnects (191) having a length that extends in a second direction, wherein each serial interconnect is disposed between and electrically connects consecutive photovoltaic cells of the array. The photovoltaic apparatus further includes a front sheet (250) disposed over the photovoltaic device, the front sheet having a plurality of structures (220), wherein each structure has one or more edges (221) aligned with one of the serial interconnects.
摘要:
The present disclosure generally relates to a photovoltaic device, and method of forming the same that has an improved manufacturing device yield and desirable electrical properties based one or more patterning techniques performed during the photovoltaic device manufacturing process. The patterning techniques include forming one or more scribed regions in a formed or partially formed photovoltaic device to inhibit the migration of cracks or defects to undesirable regions of the formed photovoltaic device and/or reduce or relieve an amount of stress found in the layers used to form the photovoltaic device.
摘要:
A method for vias and monolithic interconnects in thin-film optoelectronic devices (100, 200) wherein at least one line segment via hole (163, 165, 165′, 167) is formed by laser drilling and passes through front-contact layers (150, 152, 154, 156, 158) and semiconductive active layer (130), and wherein laser drilling causes forming a CIGS-type wall (132, 134, 136, 138) of electrically conductive permanently metalized copper-rich CIGS-type alloy at the inner surface (135) of the via hole, thereby forming a conductive path between at least a portion of front-contact and a portion of back-contact layers (120, 124, 126, 128, 129), forming a bump-shaped raised portion (155) at the surface of the front-contact layer, forming a raised portion (125, 127, 127′) of the back-contact layer, and optionally forming a raised portion of copper-rich CIGS-type alloy (155′) covering a portion of the front-contact layer (150). A thin-film CIGS device comprises at least one line segment via hole obtainable by the method.
摘要:
A photovoltaic apparatus is provided including a front sheet, a back sheet, and a photovoltaic device disposed between the front sheet and the back sheet. The photovoltaic device includes a first photovoltaic cell and a second photovoltaic cell separated in a first direction. The photovoltaic device further includes a first serial interconnect having a length that extends in a second direction. The first serial interconnect is disposed between the first photovoltaic cell from the second photovoltaic cell. The first photovoltaic cell and the second photovoltaic cell are electrically connected in series by the first interconnect. The photovoltaic apparatus further includes a spacing layer including a first roving disposed between the first interconnect and the back sheet. The first roving has a length that is aligned with the length of first serial interconnect.
摘要:
A thin-film optoelectronic module device (100) and design method comprising at least three monolithically-interconnected cells (104, 106, 108) where at least one monolithically-interconnecting line (250) depicts a spatial periodic or quasi-periodic wave and wherein the optoelectronic surface of said thin-film optoelectronic module device (100) presents at least one set of at least three zones (210, 220, 230) having curves of substantially parallel monolithic interconnect lines. Border zones (210, 230) have a lower front-contact sheet resistance than that of internal zone (220). Said curves of substantially parallel interconnecting lines may comprise peaks of triangular or rounded shape, additional spatial periods that are smaller than a baseline period, and mappings from one curve to the adjacent curve such as in the case of non-rectangular module devices (100). The device (100) and design method are advantageous to reduce costs and materials to manufacture thin-film optoelectronic module devices (100) while increasing production yield, reliability, aesthetic appearance, and range of applications.