公开(公告)号：EP1697555A2

公开(公告)日：2006-09-06

申请号：EP04820407.7

申请日：2004-11-29

申请人： Fraunhofer-Gesellschaft Zur Förderung der angewand ten Forschung e.v.

发明人： SZYSZKA, Bernd ,  PFLUG, Andreas

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/56 ,  C23C14/08

CPC分类号： C23C14/352 ,  C03C17/002 ,  C03C17/2456 ,  C03C2217/212 ,  C03C2218/156 ,  C23C14/083 ,  C23C14/35 ,  C23C14/542 ,  C23C14/562 ,  H01J37/3405 ,  H01J37/3491

摘要： The invention relates to a magnetron coating system consisting of a first coating source, an auxiliary substrate, a magnetron, in addition to means which are used to determine the area density of the auxiliary substrate. The auxiliary substrate is arranged between the first coating source and the region which is used to receive the substrate which is to be coated, forming a cathode for the magnetron. The invention further relates to a method for depositing thin layers, wherein a layer is deposited on the auxiliary substrate by means of a first coating source and said auxiliary substrate is used as a cathode for coating a substrate by means of a magnetron and the area density of the auxiliary substrate is determined.