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    ION BEAM SPUTTERING APPARATUS AND METHOD
    2.
    发明公开
    ION BEAM SPUTTERING APPARATUS AND METHOD 审中-公开

    公开(公告)号：EP4398283A2

    公开(公告)日：2024-07-10

    申请号：EP24166424.2

    申请日：2018-12-21

    申请人： Institute Of Geological And Nuclear Sciences Limited ,  Futter, Richard John ,  Davidson, Ryan James

    发明人： Futter, Richard John ,  Davidson, Ryan James ,  Leveneur, Jerome ,  Kennedy, John Vedamuthu

    IPC分类号： H01J37/34

    CPC分类号： C23C14/04 ,  C23C14/46 ,  H01J2237/314620130101 ,  H01J37/3178 ,  C23C14/14 ,  C23C14/046 ,  C23C14/562 ,  C23C14/3407

    摘要： An ion beam sputtering apparatus comprising: an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles, the target body being located relative to the ion source so that the ion beam hits the at least one target surface to sputter particles from the target body towards a surface of an object to be modified; wherein the target body is shaped so that the particles sputtered towards a surface to be modified are generally sputtered from the sputtering target in radially extending sputter directions relative to the beam axis, the sputter directions extending away from the beam axis; wherein an axis of the target body is substantially coaxial with the beam axis; and wherein the cross-sectional area of at least part of the target body, in a plane perpendicular to the beam axis, increases in a direction away from the ion source from a first cross-sectional area closer to the ion source than a second cross-sectional area further from the ion source, wherein the first cross-sectional area is substantially smaller than a cross-sectional area of the hollow portion of the ion beam, and wherein the second cross-sectional area is substantially larger than a cross-sectional area of an external periphery of the hollow ion beam. Also disclosed is a method of sputtering particles onto a surface to be modified and a method of sputtering particles onto an inner surface of an arcuate surface of a conduit.

    VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN ÜBERLANGER FLÄCHENHAFTER SUBSTRATE, INSBESONDERE GLASSCHEIBEN, IN EINER VAKUUM-BESCHICHTUNGSANLAGE
    9.
    发明公开
    VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN ÜBERLANGER FLÄCHENHAFTER SUBSTRATE, INSBESONDERE GLASSCHEIBEN, IN EINER VAKUUM-BESCHICHTUNGSANLAGE 审中-公开

    公开(公告)号：EP3368705A1

    公开(公告)日：2018-09-05

    申请号：EP16797448.4

    申请日：2016-10-20

    申请人： Grenzebach Maschinenbau GmbH

    发明人： GAWER, Olaf ,  RICHERT, Holger ,  ELLRICH, Jens

    IPC分类号： C23C14/56

    CPC分类号： C23C14/562 ,  C23C14/54 ,  C23C14/566 ,  C23C14/568

    摘要： The invention relates to a device and a method for coating extra-long sheet-type substrates, in particular glass panes, in a vacuum coating system, said system having the following features: a) a series connection of chambers, through which each substrate sheet (9) passes and which are arranged on the entry side, namely a load lock chamber (1), a buffer chamber (2) and a transfer chamber (3), the entry side of each of said chambers being vacuum-sealable by a check valve (8, 11, 15), wherein an area of process chambers (4) follows the transfer chamber (3) and an exit-side series connection of a transfer chamber (5), buffer chamber (7) and load lock chamber (8) follows the process chambers (4); b) a conveyor device (10) constructed on rollers; c) a single high-power vacuum pump (13) with an adapter flange (14) in the region of the buffer chamber (2); d) at least two flow baffles (12) in the region of the buffer chamber (2); e) a system (16) for the longitudinal displacement of the flow baffles (12) and a system (17) for adjusting the height of the flow baffles (12); f) an assembly for controlling the dynamic processes.