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    FLUID SUPPLY APPARATUS
    2.
    发明公开
    FLUID SUPPLY APPARATUS 有权
    FLUIDZUFUHRVORRICHTUNG

    公开(公告)号：EP0969342A1

    公开(公告)日：2000-01-05

    申请号：EP99900168.8

    申请日：1999-01-11

    申请人： Fujikin Inc. ,  TOKYO ELECTRON LIMITED ,  OHMI, Tadahiro

    发明人： OHMI, Tadahiro ,  KAGAZUME, Tetu, Tokyo Electron Yamanashi Ltd. ,  SUGIYAMA, Kazuhiko, Tokyo Electron Yamanashi Ltd. ,  DOHI, Ryousuke, Kabushiki-Kaisha Fujikin ,  MINAMI, Yukio, Kabushiki-Kaisha Fujikin ,  NISHINO, Kouji, Kabushiki-Kaisha Fujikin ,  KAWATA, Kouji, Kabushiki-Kaisha Fujikin ,  IKEDA, Nobukazu, Kabushiki-Kaisha Fujikin ,  YAMAJI, Michio, Kabushiki-Kaisha Fujikin

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： A fluid feeding apparatus for use in a gas supply system as in semiconductor manufacturing facilities which permits high-precision control of the flow of fluid without causing transient overshooting phenomena of fluid at the start of fluid feeding or fluid changeover.
    The fluid feeding apparatus of the present invention comprises a pressure flow controller to regulate the flow of fluid, a fluid changeover valve to open and close the fluid passage on the secondary side of the pressure flow controller and a fluid feeding control unit to control the actuation of the pressure flow controller and the fluid changeover valve, said pressure flow controller including: an orifice 5, a control valve 1 provided on the upstream side of the orifice 5, a pressure detector 3 provided between the control valve 1 and the orifice 5 and a calculation control unit 6 which inputs in a drive 2 for said control valve 1 a difference between a flow rate signal Qc and a flow rate specifying signal Qs as control signal Qy, said flow rate signal Qc calculated with flow rate Qc = KP 1 (K = constant) on the basis of a pressure P 1 detected by the pressure detector 3, wherein the flow rate on the downstream side of the orifice 5 is controlled by regulating the pressure P 1 on the upstream side of the orifice 5 through the opening and closing of said control valve 1.

    摘要翻译： 一种在半导体制造设备中用于气体供应系统的流体供给装置，其允许流体流动的高精度控制，而不会在流体供给或流体切换开始时引起流体的瞬时过冲现象。 本发明的流体供给装置包括用于调节流体流动的压力流量控制器，用于打开和关闭压力流量控制器的次级侧上的流体通道的流体切换阀以及用于控制致动器的流体供给控制单元 所述压力流量控制器包括：孔口5，设置在孔口5的上游侧的控制阀1，设置在控制阀1和孔口5之间的压力检测器3和 计算控制单元6，其在用于所述控制阀1的驱动器2中输入流量信号Qc和流量指定信号Qs之间的差作为控制信号Qy，所述流量信号Qc由流量Qc = KP1（K =常数），其中通过压力检测器3检测到的压力P1来控制孔5的下游侧的流量，通过调节压力P1 通过所述控制阀1的打开和关闭，孔5的流动侧。