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    PRESSURE TYPE FLOW RATE CONTROL APPARATUS
    1.
    发明公开
    PRESSURE TYPE FLOW RATE CONTROL APPARATUS 有权
    DRUCKABHÄNGIGEDURCHFLUSSREGELVORRICHTUNG

    公开(公告)号：EP0952505A1

    公开(公告)日：1999-10-27

    申请号：EP98937819.5

    申请日：1998-08-13

    申请人： Fujikin Inc. ,  TOKYO ELECTRON LIMITED ,  OHMI, Tadahiro

    发明人： OHMI, Tadahiro ,  KAGAZUME, Tetu, Tokyo Electron Yamanashi Ltd ,  SUGIYAMA, Kazuhiko, Tokyo Electron Yamanashi Ltd ,  DOHI, Ryousuke, Kabushiki-Kaisha Fujikin ,  UNO, Tomio, Kabushiki-Kaisha Fujikin ,  NISHINO, Kouji, Kabushiki-Kaisha Fujikin ,  FUKUDA, Hiroyuki, Kabushiki-Kaisha Fujikin ,  IKEDA, Nobukazu, Kabushiki-Kaisha Fujikin ,  YAMAJI, Michio, Kabushiki-Kaisha Fujikin

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0647 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system.
    The pressure-type flow rate control apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q = KP1 (K = constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves as variable orifice wherein the gap is adjusted by the orifice drive.

    摘要翻译： 一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。 流量控制装置设置有可变孔口，其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小，并且提供其它优点，包括改进的气体替换性，防止灰尘 形成和降低流量控制系统的制造成本。 压力式流量控制装置包括孔口，设置在孔口上游侧的控制阀，设置在控制阀和孔口之间的压力检测器，以及控制单元，用于计算流体流量Q 由压力检测器检测到的压力P1以等式Q = KP1（K =常数）检测，并且在控制阀的驱动中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy 其中通过致动用于控制孔口下游流体的流速的控制阀来调节孔口上游侧的压力P1，孔口上游侧的压力P1与孔口上游侧的压力P1之间的比率P2 / 下游压力P2保持在不高于受控流体的临界压力的比率，其特征在于，直接触摸型金属隔膜阀单元用作孔口，并且r 阀座和隔膜之间的成形间隙用作可变孔口，其中间隙由孔口驱动器调节。

    FLUID SUPPLY APPARATUS
    4.
    发明公开
    FLUID SUPPLY APPARATUS 有权
    FLUIDZUFUHRVORRICHTUNG

    公开(公告)号：EP0969342A1

    公开(公告)日：2000-01-05

    申请号：EP99900168.8

    申请日：1999-01-11

    申请人： Fujikin Inc. ,  TOKYO ELECTRON LIMITED ,  OHMI, Tadahiro

    发明人： OHMI, Tadahiro ,  KAGAZUME, Tetu, Tokyo Electron Yamanashi Ltd. ,  SUGIYAMA, Kazuhiko, Tokyo Electron Yamanashi Ltd. ,  DOHI, Ryousuke, Kabushiki-Kaisha Fujikin ,  MINAMI, Yukio, Kabushiki-Kaisha Fujikin ,  NISHINO, Kouji, Kabushiki-Kaisha Fujikin ,  KAWATA, Kouji, Kabushiki-Kaisha Fujikin ,  IKEDA, Nobukazu, Kabushiki-Kaisha Fujikin ,  YAMAJI, Michio, Kabushiki-Kaisha Fujikin

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： A fluid feeding apparatus for use in a gas supply system as in semiconductor manufacturing facilities which permits high-precision control of the flow of fluid without causing transient overshooting phenomena of fluid at the start of fluid feeding or fluid changeover.
    The fluid feeding apparatus of the present invention comprises a pressure flow controller to regulate the flow of fluid, a fluid changeover valve to open and close the fluid passage on the secondary side of the pressure flow controller and a fluid feeding control unit to control the actuation of the pressure flow controller and the fluid changeover valve, said pressure flow controller including: an orifice 5, a control valve 1 provided on the upstream side of the orifice 5, a pressure detector 3 provided between the control valve 1 and the orifice 5 and a calculation control unit 6 which inputs in a drive 2 for said control valve 1 a difference between a flow rate signal Qc and a flow rate specifying signal Qs as control signal Qy, said flow rate signal Qc calculated with flow rate Qc = KP 1 (K = constant) on the basis of a pressure P 1 detected by the pressure detector 3, wherein the flow rate on the downstream side of the orifice 5 is controlled by regulating the pressure P 1 on the upstream side of the orifice 5 through the opening and closing of said control valve 1.

    摘要翻译： 一种在半导体制造设备中用于气体供应系统的流体供给装置，其允许流体流动的高精度控制，而不会在流体供给或流体切换开始时引起流体的瞬时过冲现象。 本发明的流体供给装置包括用于调节流体流动的压力流量控制器，用于打开和关闭压力流量控制器的次级侧上的流体通道的流体切换阀以及用于控制致动器的流体供给控制单元 所述压力流量控制器包括：孔口5，设置在孔口5的上游侧的控制阀1，设置在控制阀1和孔口5之间的压力检测器3和 计算控制单元6，其在用于所述控制阀1的驱动器2中输入流量信号Qc和流量指定信号Qs之间的差作为控制信号Qy，所述流量信号Qc由流量Qc = KP1（K =常数），其中通过压力检测器3检测到的压力P1来控制孔5的下游侧的流量，通过调节压力P1 通过所述控制阀1的打开和关闭，孔5的流动侧。