公开(公告)号：EP1161574B1

公开(公告)日：2003-12-17

申请号：EP00907176.2

申请日：2000-02-04

申请人： General Electric Company

发明人： IACOVANGELO, Charles, Dominic ,  BORST, Keith, Milton ,  JERABEK, Elihu, Calvin ,  MARZANO, Patrick, Peter ,  YANG, Barry, Lee-Mean

IPC分类号： C23C16/50 ,  B05B7/22 ,  C23C14/22 ,  C23C14/24

CPC分类号： C23C14/228 ,  C23C14/32 ,  C23C16/513 ,  H01J37/32422

公开(公告)号：EP1161574A1

公开(公告)日：2001-12-12

申请号：EP00907176.2

申请日：2000-02-04

申请人： General Electric Company

发明人： IACOVANGELO, Charles, Dominic ,  BORST, Keith, Milton ,  JERABEK, Elihu, Calvin ,  MARZANO, Patrick, Peter ,  YANG, Barry, Lee-Mean

IPC分类号： C23C16/50 ,  B05B7/22 ,  C23C14/22 ,  C23C14/24

CPC分类号： C23C14/228 ,  C23C14/32 ,  C23C16/513 ,  H01J37/32422

摘要： A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant (12); introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate (20). This method is used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate (20). An apparatus (4) for depositing a UV filter coating on a polymeric substrate comprises a plasma generator (10) having an anode (19) and a cathode (13) to form a plasma, and a first inlet (12) for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate (20) by the plasma (50). Optionally, an injection nozzle (18) can be utilized to provide a controlled delivery of the first reactant into the plasma (50).