公开(公告)号：EP0452846A3

公开(公告)日：1992-01-29

申请号：EP91105963.2

申请日：1991-04-15

申请人： HITACHI, LTD.

发明人： Takano, Hisashi ,  Koyama, Naoki ,  Tanabe, Hideo ,  Moriwaki, Eijin ,  Yuito, Isamu ,  Shiiki, Kazuo ,  Ohnishi, Tsuyoshi ,  Ishitani, Tohru ,  Kobayashi, Toshio ,  Todokoro, Hideo ,  Ishikawa, Chiaki, (nee Saka)

IPC分类号： G11B5/31 ,  G11B5/39 ,  G11B5/60

CPC分类号： G11B5/3903 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3103 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  G11B5/3967

摘要： In a composite magnetic head comprising a magnetoresistive read head (10) including a magnetic thin film having a magnetoresistive effect and soft magnetic members interposing the soft magnetic film between them through a non-magnetic insulation layer, an induction type write head (11) including poles formed in a moving direction of a medium and a conductor crossing the poles, and disposed in the proximity of the magnetoresistive head, and a substrate (5) supporting these heads, the present disclosure describes a composite magnetic head characterized in that part of a floating surface inclusive of the magnetic head constituent members has recesses (7, 8) and the read/write operations to and from the medium are effected by the portion interposed by these recesses.

公开(公告)号：EP0452846A2

公开(公告)日：1991-10-23

申请号：EP91105963.2

申请日：1991-04-15

申请人： HITACHI, LTD.

发明人： Takano, Hisashi ,  Koyama, Naoki ,  Tanabe, Hideo ,  Moriwaki, Eijin ,  Yuito, Isamu ,  Shiiki, Kazuo ,  Ohnishi, Tsuyoshi ,  Ishitani, Tohru ,  Kobayashi, Toshio ,  Todokoro, Hideo ,  Ishikawa, Chiaki, (nee Saka)

IPC分类号： G11B5/31 ,  G11B5/39 ,  G11B5/60

CPC分类号： G11B5/3903 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3103 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  G11B5/3967

摘要： In a composite magnetic head comprising a magnetoresistive read head (10) including a magnetic thin film having a magnetoresistive effect and soft magnetic members interposing the soft magnetic film between them through a non-magnetic insulation layer, an induction type write head (11) including poles formed in a moving direction of a medium and a conductor crossing the poles, and disposed in the proximity of the magnetoresistive head, and a substrate (5) supporting these heads, the present disclosure describes a composite magnetic head characterized in that part of a floating surface inclusive of the magnetic head constituent members has recesses (7, 8) and the read/write operations to and from the medium are effected by the portion interposed by these recesses.

摘要翻译： 在包括具有磁阻效应的磁性薄膜的磁阻读取头（10）的复合磁头和通过非磁性绝缘层在它们之间插入软磁性膜的软磁性部件构成的感应型写入头（11）包括： 在介质的移动方向上形成的磁极和与磁极交叉的导体并且设置在磁阻磁头的附近以及支撑这些磁头的衬底（5）上，本公开描述了一种复合磁头，其特征在于， 包括磁头构成部件的浮动表面具有凹部（7,8），并且来自介质的读取/写入操作由插入这些凹部的部分实现。

公开(公告)号：EP0734045A3

公开(公告)日：1997-11-12

申请号：EP96103903.9

申请日：1996-03-12

申请人： HITACHI, LTD.

发明人： Ishitani, Tohru ,  Ohnishi, Tsuyoshi

IPC分类号： H01J37/30

CPC分类号： H01J37/3007 ,  H01J37/3005 ,  H01J2237/31742

摘要： In an optical system, the total optical path length from the emitter tip of an ion source (1) to the surface of a sample (10) is in the range of from 300 to 450 mm, the distance from the ion source to the centre of a condenser lens (2) is in the range of from 15 to 45 mm, and the distance from the centre of an objective lens (8) to the sample is in the range of from 10 to 40 mm. The optical system is installed in a focused ion beam apparatus in order to realise milling of fine elements to high accuracy at high speed, image observation with high resolution in failure analysis and process evaluation of fine elements such as semiconductors.

公开(公告)号：EP0734045A2

公开(公告)日：1996-09-25

申请号：EP96103903.9

申请日：1996-03-12

申请人： HITACHI, LTD.

发明人： Ishitani, Tohru ,  Ohnishi, Tsuyoshi

IPC分类号： H01J37/30

CPC分类号： H01J37/3007 ,  H01J37/3005 ,  H01J2237/31742

摘要： In an optical system, the total optical path length from the emitter tip of an ion source (1) to the surface of a sample (10) is in the range of from 300 to 450 mm, the distance from the ion source to the centre of a condenser lens (2) is in the range of from 15 to 45 mm, and the distance from the centre of an objective lens (8) to the sample is in the range of from 10 to 40 mm. The optical system is installed in a focused ion beam apparatus in order to realise milling of fine elements to high accuracy at high speed, image observation with high resolution in failure analysis and process evaluation of fine elements such as semiconductors.

摘要翻译： 在光学系统中，从离子源（1）的发射极尖端到样品（10）的表面的总光路长度在从300到450mm的范围内，从离子源到中心的距离 聚光透镜（2）的距离在15至45mm的范围内，并且从物镜（8）的中心到样品的距离在10至40mm的范围内。 光学系统安装在聚焦离子束装置中，以实现高精度高精度铣削，高分辨率图像观察，半导体等精细元件的工艺评估。

公开(公告)号：EP0452846B1

公开(公告)日：1996-02-28

申请号：EP91105963.2

申请日：1991-04-15

申请人： HITACHI, LTD.

发明人： Takano, Hisashi ,  Koyama, Naoki ,  Tanabe, Hideo ,  Moriwaki, Eijin ,  Yuito, Isamu ,  Shiiki, Kazuo ,  Ohnishi, Tsuyoshi ,  Ishitani, Tohru ,  Kobayashi, Toshio ,  Todokoro, Hideo ,  Ishikawa, Chiaki, (nee Saka)

IPC分类号： G11B5/31 ,  G11B5/39 ,  G11B5/60

CPC分类号： G11B5/3903 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3103 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3143 ,  G11B5/3163 ,  G11B5/3967