公开(公告)号：EP0620500A3

公开(公告)日：1996-01-03

申请号：EP94105635.0

申请日：1994-04-12

申请人： HITACHI, LTD. ,  Hitachi Chemical Co., Ltd.

发明人： Uchino, Shoichi ,  Migitaka, Sonoko ,  Ueno, Takumi ,  Onozuka, Toshihiko ,  Shirai, Seiichirou ,  Moriuchi, Noboru ,  Sasaki, Mamoru ,  Hashimoto, Michiaki ,  Hayashi, Nobuaki

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/008 ,  G03F7/039

CPC分类号： G03F7/022 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0085

摘要： Herein is disclosed a resist which comprises a water repellent compound having a functional group of which water repellent ability disappears through a nucleophilic substitution reaction with alkali or at least two functional groups, in one molecule, of which water repellent ability disappears through a reaction with alkali, and a permeability-variable composition of which alkaline solution-permeability is changed by radiation exposure or radiation exposure and baking after radiation exposure, said resist being excellent in sensitivity to UV light, electron beam, X-ray and other radiations, high in resolution capability and developable with aqueous alkaline solution; as well as a pattern forming method using said resist.

公开(公告)号：EP0620500A2

公开(公告)日：1994-10-19

申请号：EP94105635.0

申请日：1994-04-12

申请人： HITACHI, LTD. ,  Hitachi Chemical Co., Ltd.

发明人： Uchino, Shoichi ,  Migitaka, Sonoko ,  Ueno, Takumi ,  Onozuka, Toshihiko ,  Shirai, Seiichirou ,  Moriuchi, Noboru ,  Sasaki, Mamoru ,  Hashimoto, Michiaki ,  Hayashi, Nobuaki

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/008 ,  G03F7/039

CPC分类号： G03F7/022 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0085

摘要： Herein is disclosed a resist which comprises a water repellent compound having a functional group of which water repellent ability disappears through a nucleophilic substitution reaction with alkali or at least two functional groups, in one molecule, of which water repellent ability disappears through a reaction with alkali, and a permeability-variable composition of which alkaline solution-permeability is changed by radiation exposure or radiation exposure and baking after radiation exposure, said resist being excellent in sensitivity to UV light, electron beam, X-ray and other radiations, high in resolution capability and developable with aqueous alkaline solution; as well as a pattern forming method using said resist.

摘要翻译： 本发明公开了一种抗蚀剂，其包含具有通过与碱或至少两个官能团的亲核取代反应而消失的官能团的防水化合物，在一个分子中，其斥水能力通过与碱反应而消失 ，以及通过放射线曝光或放射线曝光和烘烤后的碱溶液渗透性变化的透过性变化组合物，所述抗蚀剂对紫外线，电子束，X射线等的辐射敏感度优异，分辨率高 能力并用碱性水溶液显影; 以及使用所述抗蚀剂的图案形成方法。