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公开(公告)号:EP0282988A3
公开(公告)日:1990-01-17
申请号:EP88104169.3
申请日:1988-03-16
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Ikeguchi, Takashi , Matsumoto, Manabu , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Shibayama, Akinori
CPC分类号: H05H7/00
摘要: An industrial, compact synchrotron radiation source comprises SR-light absorbers (31, 33) made of a material having a low gas desorption. The absorbers are positioned inside a bending section/vacuum chamber (1). At least the positions marked A and the surface of the electrically conductive beam stabilizers (61) are to be provided with the absorber.
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公开(公告)号:EP0282988A2
公开(公告)日:1988-09-21
申请号:EP88104169.3
申请日:1988-03-16
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Ikeguchi, Takashi , Matsumoto, Manabu , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Shibayama, Akinori
CPC分类号: H05H7/00
摘要: An industrial, compact synchrotron radiation source comprises SR-light absorbers (31, 33) made of a material having a low gas desorption. The absorbers are positioned inside a bending section/vacuum chamber (1). At least the positions marked A and the surface of the electrically conductive beam stabilizers (61) are to be provided with the absorber.
摘要翻译: 工业紧凑型同步加速器辐射源包括由具有低气体解吸的材料制成的SR-光吸收器(31,33)。 吸收器位于弯曲部分/真空室(1)内。 至少标记为A的位置和导电梁稳定器(61)的表面应设置吸收器。
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公开(公告)号:EP0278504B1
公开(公告)日:1994-06-15
申请号:EP88101999.6
申请日:1988-02-11
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Matsumoto, Manabu , Ikeguchi, Takashi , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Kazawa, Yoshiaki , Kakiuchi, Shunji , Kobari, Toshiaki
CPC分类号: H05H7/00
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公开(公告)号:EP0282988B1
公开(公告)日:1994-03-02
申请号:EP88104169.3
申请日:1988-03-16
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Ikeguchi, Takashi , Matsumoto, Manabu , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Shibayama, Akinori
CPC分类号: H05H7/00
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公开(公告)号:EP0278504A3
公开(公告)日:1990-01-24
申请号:EP88101999.6
申请日:1988-02-11
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Matsumoto, Manabu , Ikeguchi, Takashi , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Kazawa, Yoshiaki , Kakiuchi, Shunji , Kobari, Toshiaki
CPC分类号: H05H7/00
摘要: An industrial compact synchrotron radiation source with improved vacuum to prolong life-time of a charged particle beam. The synchrotron supplies highly stable, intense synchrotron radiation. In the source, a charged particle beam bending duct (1) forming a vacuum chamber through which the charged particle beam circulates, is encompassed by a bending electromagnet (2). At least one SR guide duct (3) for guiding the radiation to the outside extends from the outer circumferential wall (1e) of the bending duct. The SR guide duct is connected through a gate valve (5) to an SR beam line duct (7) for guiding the SR beam to an object to be worked on. A vacuum pump (4) is disposed on the side of the gate valve, close to an orbit (A) of the charged particle beam. The SR guide duct extending from the outer circumferential wall of the bending duct takes the form of a divergent duct which is widened in accordance with a spreading angle (ϑs) of the SR beam travelling through the SR guide duct.
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公开(公告)号:EP0278504A2
公开(公告)日:1988-08-17
申请号:EP88101999.6
申请日:1988-02-11
申请人: HITACHI, LTD. , NIPPON TELEGRAPH AND TELEPHONE CORPORATION , HITACHI ENGINEERING AND SERVICES CO., LTD.
发明人: Matsumoto, Manabu , Ikeguchi, Takashi , Ueda, Shinjiroo , Sonobe, Tadasi , Murashita, Toru , Ido, Satoshi , Kuroishi, Kazuo , Kazawa, Yoshiaki , Kakiuchi, Shunji , Kobari, Toshiaki
CPC分类号: H05H7/00
摘要: An industrial compact synchrotron radiation source with improved vacuum to prolong life-time of a charged particle beam. The synchrotron supplies highly stable, intense synchrotron radiation. In the source, a charged particle beam bending duct (1) forming a vacuum chamber through which the charged particle beam circulates, is encompassed by a bending electromagnet (2). At least one SR guide duct (3) for guiding the radiation to the outside extends from the outer circumferential wall (1e) of the bending duct. The SR guide duct is connected through a gate valve (5) to an SR beam line duct (7) for guiding the SR beam to an object to be worked on. A vacuum pump (4) is disposed on the side of the gate valve, close to an orbit (A) of the charged particle beam. The SR guide duct extending from the outer circumferential wall of the bending duct takes the form of a divergent duct which is widened in accordance with a spreading angle (ϑs) of the SR beam travelling through the SR guide duct.
摘要翻译: 具有改善真空度的工业致密同步加速器辐射源,以延长带电粒子束的寿命。 同步加速器提供高度稳定,强烈的同步辐射。 在源中,形成带电粒子束循环的真空室的带电粒子束弯曲管道(1)由弯曲电磁体(2)包围。 用于将辐射引导到外部的至少一个SR引导管道(3)从弯曲管道的外周壁(1e)延伸。 SR引导管通过闸阀(5)连接到SR梁线管道(7),用于将SR梁引导到待加工物体。 真空泵(4)设置在闸阀侧面,靠近带电粒子束的轨道(A)。 从弯曲管道的外周壁延伸的SR导向管呈采取扩散管道的形式,该管道根据穿过SR导管的SR束的扩展角度(θs)加宽。
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公开(公告)号:EP0388123A3
公开(公告)日:1991-07-10
申请号:EP90302611.0
申请日:1990-03-12
发明人: Sonobe, Tadasi , Katane, Mamoru , Ikeguchi, Takashi , Matsumoto, Manabu , Ueda, Shinjiro , Kobari, Toshiaki , Takahashi, Takao , Hayasaka, Toa , Kitayama, Toyoki
摘要: Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct (3) as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump (4) has a main magnetic field (13), normally generated by a magnet (12) of the ion pump (4) which controls the behaviour of the electrons in the ion pump (4). However, the leakage magnetic field (14) of the bending magnet effects the ion pump (4), and therefore the ion pump (4) is arranged so that its main magnetic field (13) is aligned with the leakage magnetic field (14) at the ion pump (4), or at least with a main component thereof. In this way, the effect of the leakage magnetic field (14) on the ion pump (4) is reduced. Indeed, it is possible to use the leakage magnetic field (14) as the main magnetic field of the ion pump (4).
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公开(公告)号:EP0388123B1
公开(公告)日:1995-05-31
申请号:EP90302611.0
申请日:1990-03-12
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9.
公开(公告)号:EP0388123A2
公开(公告)日:1990-09-19
申请号:EP90302611.0
申请日:1990-03-12
发明人: Sonobe, Tadasi , Katane, Mamoru , Ikeguchi, Takashi , Matsumoto, Manabu , Ueda, Shinjiro , Kobari, Toshiaki , Takahashi, Takao , Hayasaka, Toa , Kitayama, Toyoki
摘要: Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct (3) as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump (4) has a main magnetic field (13), normally generated by a magnet (12) of the ion pump (4) which controls the behaviour of the electrons in the ion pump (4). However, the leakage magnetic field (14) of the bending magnet effects the ion pump (4), and therefore the ion pump (4) is arranged so that its main magnetic field (13) is aligned with the leakage magnetic field (14) at the ion pump (4), or at least with a main component thereof. In this way, the effect of the leakage magnetic field (14) on the ion pump (4) is reduced. Indeed, it is possible to use the leakage magnetic field (14) as the main magnetic field of the ion pump (4).
摘要翻译: 当带电粒子的基底被弯曲磁体弯曲时,产生同步辐射。 当泵的总数受设备的尺寸限制时,同步加速器辐射通过导出管道(3),并且需要许多泵以获得良好的真空。 离子泵(4)具有通常由离子泵(4)的磁体(12)产生的主磁场(13),其控制离子泵(4)中的电子的行为。 然而,弯曲磁体的泄漏磁场(14)影响离子泵(4),因此离子泵(4)被布置成使得其主磁场(13)与漏磁场(14)对准, 在离子泵(4)处,或至少与其主要成分。 以这种方式,泄漏磁场(14)对离子泵(4)的影响减小。 实际上,可以使用泄漏磁场(14)作为离子泵(4)的主磁场。
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公开(公告)号:EP0315134A3
公开(公告)日:1990-01-24
申请号:EP88118226.5
申请日:1988-11-02
IPC分类号: H05H7/00
CPC分类号: H05H7/00
摘要: A synchrotron radiation source and a method of making the same are concerned. An assembly of a beam absorber (1) for synchrotron radiation beams and a piping (2) for cooling the beam absorber (1) is mounted in a charged particle beam duct (5) of a bending section (10) for bending a charged particle beam. Fixed to at least one of straight ducts (8) connectable to the opposite ends of the charged particle beam duct (5) is a piping guide duct (7) through which the beam absorber cooling piping (2) is drawn to the outside, so that the assembly of the beam absorber (1) and beam absorber cooling piping (2) can readily be mounted in the synchrotron radiation source.
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