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1.发明公开Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same 失效Phosphormuster，Verfahren zur Herstellung desselben und lichtempfindliches verwendetes Elementdafür
公开(公告)号：EP1387384A1
公开(公告)日：2004-02-04
申请号：EP03024548.4
申请日：1997-01-21
发明人： Nojiri, Takeshi , Tsuiki, Hideyasu , Tanaka, Hiroyuki , Wada, Yumiko , Tai, Seiji , Tanno, Seiichi , Kakumaru, Hajime , Sato, Kazuya , Kimura, Naoki , Mukai, Ikuo
CPC分类号： G03F1/56 , G03F7/0007 , H01J9/2271 , H01J2211/42 , H01J2217/49
摘要： Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate,
wherein when the length from the bottom of the concave portion to the top of a convex portion is L (µm), the phosphor pattern thickness ratio (x)/(y) of the thickness (x) of the phosphor pattern formed on an uneven wall surface at a position of 0.9 x L from the bottom of the concave portion toward the top of the convex portion to the thickness (y) of the phosphor pattern formed on the uneven wall surface at a position of 0.4 x L from the bottom of the concave portion toward the top of the convex portion satisfies a range of 0.1 to 1.5, and processes for preparing the same.摘要翻译： 公开了一种荧光体图案，其包括具有凹凸的基板和形成在基板的凹部的内表面上的荧光体层，其中，当从凹部的底部到凸部的顶部的长度为L（mu m），形成在从凹部的底部朝向顶部的0.9×L的位置处的不平坦壁面上的荧光体图案的厚度（x）的荧光体图案厚度比（x）/（y） 形成在从凹部的底部到凸部的顶部的0.4×L的位置处形成在不平坦壁面上的荧光体图案的厚度（y）的凸部满足0.1〜1.5的范围， 准备一样
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