Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
    2.
    发明公开
    Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same 失效
    用于使用用于生产薄金刚石薄膜的等离子和装置的方法的微波装置。

    公开(公告)号:EP0420117A2

    公开(公告)日:1991-04-03

    申请号:EP90118332.7

    申请日:1990-09-24

    IPC分类号: H05H1/46

    摘要: A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means (1,1A,4,5,16,24;3,7) for radiating a plurality of microwaves having different directions of electric fields (Ex,Ey) from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate (14) to be formed thereon with the diamond thin film, the substrate (14) being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.

    摘要翻译: 用于通过微波辐射到其中放电发生的空间中产生等离子体的微波等离子体产生装置包含微波辐射装置(1.1A,4,5,16,24,3.7)的多个用于发射微波的多元性 具有从海誓山盟电场(实施例,EY)的不同的方向。 该微波等离子体生成装置可通过供给到所述空间激发碳源气体产生金刚石薄膜并且使激发气体与基板(14)接触的方式与所述金刚石薄膜,所述基片(14)是其上形成 设置在其中进行放电的空间。 该装置可以产生大量的等离子体以稳定的方式,并且作为结果,在一个大的面积作为一个整体提供一个金刚石薄膜。