摘要:
A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means (1,1A,4,5,16,24;3,7) for radiating a plurality of microwaves having different directions of electric fields (Ex,Ey) from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate (14) to be formed thereon with the diamond thin film, the substrate (14) being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.
摘要:
A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means (1,1A,4,5,16,24;3,7) for radiating a plurality of microwaves having different directions of electric fields (Ex,Ey) from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate (14) to be formed thereon with the diamond thin film, the substrate (14) being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.