公开(公告)号：EP0374487A3

公开(公告)日：1991-03-13

申请号：EP89121299.5

申请日：1989-11-17

申请人： International Business Machines Corporation

发明人： Viehbeck, Alfred ,  Buchwalter, Stephen L. ,  Donson, William A. ,  Glenning, John J. ,  Goldberg, Martin J. ,  Grebe, Kurt R. ,  Kovac, Caroline A. ,  Matthew, Linda C. ,  Pawlowski, Walter P. ,  Schadt, Mark J. ,  Scheuermann, Michael R. ,  Tisdale, Stephen L.

IPC分类号： C23C18/28

CPC分类号： C23C18/1608 ,  C23C18/166 ,  C23C18/2086 ,  C23C18/28 ,  C23C18/30 ,  H05K3/381 ,  Y10S525/903

摘要： Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the de­sirable characteristic of good adhesion to the poly­meric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.

公开(公告)号：EP0374487B1

公开(公告)日：1994-06-29

申请号：EP89121299.5

申请日：1989-11-17

申请人： International Business Machines Corporation

发明人： Viehbeck, Alfred ,  Buchwalter, Stephen L. ,  Donson, William A. ,  Glenning, John J. ,  Goldberg, Martin J. ,  Grebe, Kurt R. ,  Kovac, Caroline A. ,  Matthew, Linda C. ,  Pawlowski, Walter P. ,  Schadt, Mark J. ,  Scheuermann, Michael R. ,  Tisdale, Stephen L.

IPC分类号： C23C18/28

CPC分类号： C23C18/1608 ,  C23C18/166 ,  C23C18/2086 ,  C23C18/28 ,  C23C18/30 ,  H05K3/381 ,  Y10S525/903

公开(公告)号：EP0374487A2

公开(公告)日：1990-06-27

申请号：EP89121299.5

申请日：1989-11-17

申请人： International Business Machines Corporation

发明人： Viehbeck, Alfred ,  Buchwalter, Stephen L. ,  Donson, William A. ,  Glenning, John J. ,  Goldberg, Martin J. ,  Grebe, Kurt R. ,  Kovac, Caroline A. ,  Matthew, Linda C. ,  Pawlowski, Walter P. ,  Schadt, Mark J. ,  Scheuermann, Michael R. ,  Tisdale, Stephen L.

IPC分类号： C23C18/28

CPC分类号： C23C18/1608 ,  C23C18/166 ,  C23C18/2086 ,  C23C18/28 ,  C23C18/30 ,  H05K3/381 ,  Y10S525/903

摘要： Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the de­sirable characteristic of good adhesion to the poly­meric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.

摘要翻译： 某些有机聚合材料能够可逆地接受或捐赠来自还原剂的电子。 聚合物中的氧化还原位点接受电子，结果发生聚合物的性质变化。 该改变可用于改性或蚀刻聚合物材料。 可以通过在受控的深度将金属种子并入材料中来修饰材料。 种子通过金属阳离子与聚合物中的氧化还原位点的相互作用而引入，这导致阳离子的还原形成中性金属种子。 随后将包含种子的聚合材料暴露于无电镀浴中导致具有对聚合材料具有良好粘附性的所需特性的金属的进一步沉积。 当聚合物的氧化还原位点已经接受电子时，聚合物材料的蚀刻可以作为聚合物在非质子传递溶剂中的溶解度增加的结果来进行。 增加的溶解度允许在已经还原的聚合材料的某些区域中蚀刻开口，留下其它区域不变。