-
公开(公告)号：EP0002889A3
公开(公告)日：1979-07-25
申请号：EP78300702
申请日：1978-12-01
发明人： Coburn, John Wyllie , Kay, Eric
CPC分类号： B05D1/62 , Y10T428/31544
摘要： A method of forming a polymer film containing metal therein includes the steps of providing an electrode of a metal that can be etched by a halogen, providing a substrate for the polymer film to be deposited thereon, and passing a halocarbon monomer through a plasma system so that the metal etched from the electrode forms a volatile halide and is incorporated in the polymer film that is deposited on the substrate.
摘要翻译： 形成含有金属的聚合物膜的方法包括以下步骤：提供可被卤素蚀刻的金属电极，提供用于沉积在其上的聚合物膜的基底，并使卤代烃单体通过等离子体系统 从电极蚀刻的金属形成挥发性卤化物，并且被结合到沉积在基板上的聚合物膜中。
-
公开(公告)号：EP0002889A2
公开(公告)日：1979-07-11
申请号：EP78300702.4
申请日：1978-12-01
发明人： Coburn, John Wyllie , Kay, Eric
CPC分类号： B05D1/62 , Y10T428/31544
摘要： A method of forming a polymer film containing metal therein includes the steps of providing an electrode of a metal that can be etched by a halogen, providing a substrate for the polymer film to be deposited thereon, and passing a halocarbon monomer through a plasma system so that the metal etched from the electrode forms a volatile halide and is incorporated in the polymer film that is deposited on the substrate.
摘要翻译： 形成含有金属的聚合物膜的方法包括以下步骤：提供可被卤素蚀刻的金属电极，提供用于沉积在其上的聚合物膜的基底，并使卤代烃单体通过等离子体系统 从电极蚀刻的金属形成挥发性卤化物，并且被结合到沉积在基板上的聚合物膜中。
-
3.发明公开
公开(公告)号：EP0222496A1
公开(公告)日：1987-05-20
申请号：EP86307623.8
申请日：1986-10-02
CPC分类号： C23C26/00 , H05K3/105 , H05K2201/015 , H05K2203/107 , H05K2203/1131
摘要： A method of producing an electrically conductive pattern on a substrate by exposing a very thin film on the surface comprising electrically conductive particle clusters in an insulating matrix to radiation from a laser. The electrically conductive particles, which may be of gold, agglomerate into conductive paths as defined by the laser irradiation. The insulating matrix may be of PTFE. A typical film thickness is 1500Å and typical pre-irradiation particle cluster size is from 25 to 150Å.
摘要翻译： 制备导电图案上的基片由表面在从激光绝缘基质的辐射包括在导电颗粒簇上露出的极薄的膜的一种方法。 导电颗粒，其可以是金，附聚成导电通路通过激光照射所定义的。 绝缘基质可以是PTFE的。 典型的膜厚度为1500埃，典型预辐照粒子簇的大小是从25到150埃。
-
公开(公告)号：EP0068077A1
公开(公告)日：1983-01-05
申请号：EP82102404.9
申请日：1982-03-23
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/32135 , C23F1/12 , H01L21/3065 , H01L21/32136 , H01L21/32137
摘要： A substrate (e.g. of silicon) which forms a volatile fluoride is etched and directionality is achieved using vibrationally excited SF 3 which has been exposed to laser irradiation. The substrate is etched through a mask having openings smaller than the diffraction limit of the laser light.
-
公开(公告)号：EP0222496B1
公开(公告)日：1989-09-20
申请号：EP86307623.8
申请日：1986-10-02
CPC分类号： C23C26/00 , H05K3/105 , H05K2201/015 , H05K2203/107 , H05K2203/1131
-
公开(公告)号：EP0068077B1
公开(公告)日：1985-02-06
申请号：EP82102404.9
申请日：1982-03-23
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/32135 , C23F1/12 , H01L21/3065 , H01L21/32136 , H01L21/32137
-
公开(公告)号：EP0002889B1
公开(公告)日：1981-08-05
申请号：EP78300702.4
申请日：1978-12-01
发明人： Coburn, John Wyllie , Kay, Eric
CPC分类号： B05D1/62 , Y10T428/31544
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.011 秒)
