Integrated semiconductor memory matrix using one-FET cells
    2.
    发明公开
    Integrated semiconductor memory matrix using one-FET cells 失效
    使用单FET电池的集成半导体存储器矩阵

    公开(公告)号:EP0035646A3

    公开(公告)日:1983-08-03

    申请号:EP81100811

    申请日:1981-02-05

    IPC分类号: G11C17/00 G11C11/56 H01L27/10

    摘要: A storage system, such as a read only memory, is provided which includes field effect transistors (54, 56) each having first and second spaced apart diffusion regions (38,40; 46, 48) of a given conductivity and a gate electrode (28,30), with at least one of the two diffusion regions of selected transistors having a third diffusion (42,44) adjacent to one of the first and second diffusion regions (38, 40; 46,48) under the gate electrodes (28, 30) to provide a higher voltage threshold for the gate electrode to one diffusion than for the gate electrode to the other of the two diffusions. A voltage is applied to the first diffusion (38) having a polarity and magnitude sufficient to neutralize or eliminate the effects of the higher threshold during a first time period and the current flowing between the first and second diffusions (38,40; 46,48) is sensed. During a second period of time the voltage is applied to the second diffusion (46, 48) and the current flow between the first and second diffusions (38, 40; 46, 48) is again sensed. In this manner two cells or bits of information are stored in each transistor (54, 56), one at the first diffusion (38) and one at the second diffusion (48). Multilevel storing may also be employed by establishing one of more than two predetermined voltage thresholds at each of the first and second diffusions.

    Integrated semiconductor memory matrix using one-FET cells
    3.
    发明公开
    Integrated semiconductor memory matrix using one-FET cells 失效
    集成半导体存储器阵列与一个-FET细胞。

    公开(公告)号:EP0035646A2

    公开(公告)日:1981-09-16

    申请号:EP81100811.9

    申请日:1981-02-05

    IPC分类号: G11C17/00 G11C11/56 H01L27/10

    摘要: A storage system, such as a read only memory, is provided which includes field effect transistors (54, 56) each having first and second spaced apart diffusion regions (38,40; 46, 48) of a given conductivity and a gate electrode (28,30), with at least one of the two diffusion regions of selected transistors having a third diffusion (42,44) adjacent to one of the first and second diffusion regions (38, 40; 46,48) under the gate electrodes (28, 30) to provide a higher voltage threshold for the gate electrode to one diffusion than for the gate electrode to the other of the two diffusions. A voltage is applied to the first diffusion (38) having a polarity and magnitude sufficient to neutralize or eliminate the effects of the higher threshold during a first time period and the current flowing between the first and second diffusions (38,40; 46,48) is sensed. During a second period of time the voltage is applied to the second diffusion (46, 48) and the current flow between the first and second diffusions (38, 40; 46, 48) is again sensed. In this manner two cells or bits of information are stored in each transistor (54, 56), one at the first diffusion (38) and one at the second diffusion (48). Multilevel storing may also be employed by establishing one of more than two predetermined voltage thresholds at each of the first and second diffusions.