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公开(公告)号:EP2396812A1
公开(公告)日:2011-12-21
申请号:EP10767544.9
申请日:2010-04-15
IPC分类号: H01L21/335
CPC分类号: H01L29/7856 , H01L29/66795
摘要: Multiple threshold voltage (Vt) field-effect transistor (FET) devices and techniques for the fabrication thereof are provided. In one aspect, a FET device is provided including a source region; a drain region; at least one channel interconnecting the source and drain regions; and a gate, surrounding at least a portion of the channel, configured to have multiple threshold voltages due to the selective placement of at least one band edge metal throughout the gate.