-
1.发明公开Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers 失效在碱性发酵剂中具有降低的溶解速率的基于二氧杂环辛烷基的基于聚酰胺酸的光催化组合物
公开(公告)号：EP0224680A3
公开(公告)日：1987-11-25
申请号：EP86113861
申请日：1986-10-07
IPC分类号： G03F07/08
CPC分类号： G03F7/0233
摘要： The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
-
2.发明公开Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers 失效具有基于由重氮醌聚酰胺酸敏化降低光刻胶组合物的溶液度基本开发商，。
公开(公告)号：EP0224680A2
公开(公告)日：1987-06-10
申请号：EP86113861.8
申请日：1986-10-07
IPC分类号： G03F7/022
CPC分类号： G03F7/0233
摘要： The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
摘要翻译： 基于重氮醌敏聚酰胺酸图像式曝光的光致抗蚀剂系统的碱性显影剂溶液中的溶解速率降低之前通过降低聚酰胺酸的酸度，以曝光，以制备细线分辨率的立体图像。
-
3.发明授权Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers 失效在碱性发酵剂中具有降低的溶解速率的二唑基苯酚敏化的基于聚酰胺酸的光催化组合物
公开(公告)号：EP0224680B1
公开(公告)日：1992-01-15
申请号：EP86113861.8
申请日：1986-10-07
IPC分类号： G03F7/022
CPC分类号： G03F7/0233
-
-
搜索结果
3 条记录 (耗时 0.009 秒)
